Used LAM RESEARCH Kiyo Poly #9353174 for sale

LAM RESEARCH Kiyo Poly is an advanced anisotropic dry etcher / asher equipment used for anisotropic etching of photoresists and polymers films. The system is designed to provide precise control of selectivity, anisotropic etching profiles and excellent material uniformity. The technology combines radio frequency (RF) and direct current (DC) bias power, pre-set recipes and a vacuum chamber housing the process wafers. Kiyo Poly is equipped with a four chamber DC etcher and a five-electrode RF generator incorporated in a single compact unit. This machine draws from a range of etching processes to achieve optimized etching of photoresists, polymers films, and even samples of carbon nanotubes. It offers superior selectivity and profiles with uniformity over large areas. The Kiyo's dry etching process is powered by etching gases like chlorine (Cl2), nitrogen trifluoride (NF3) and thermal enhanced ethylene fluoride (TEF) which are used in several combination depending on the material being etched. Heating elements are used to generate the required temperature levels during the process control data and are monitored automatically by the on board process controller. The etching chemistry and parameters are managed and optimized with the help of the etch-profile-monitoring software which uses a full digital feedback loop to adjust the parameters in real-time. The pre-programmed recipes stored in the process controller of the tool provide versatile etching of different kinds of materials. The use of etching gases in combination with RF bias power and DC bias power to electro-chemically etch photoresists, polymers and other materials produces precise profile control and an ideal etch rate. The user can define the selectivity of etching and can even adjust the recipe to suit the shape of the sample material. An automatic wafer loader enables the asset to process several substrates simultaneously, producing excellent repeatability, accuracy and consistency. LAM RESEARCH Kiyo Poly is a versatile, cost-effective and reliable etcher suitable for a wide range of industries such as semiconductors, photovoltaics, telecoms and medical. Its advanced features and robust design make it a reliable choice for etching a range of substrates with superior uniformity, accuracy and repeatability.