Used LAM RESEARCH Kiyo #9282757 for sale
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ID: 9282757
Poly etcher
(3) Chambers (PM2, 3, 4)
With microwave (PM1)
MF (EFEM / TM):
Platform type: V2
(3) BROOKS 002-7200-32 Load ports
BROOKS 138150 ATM Robot
BROOKS 401600-201-0002-FRU TM Robot
EDWARDS A419-42-212 IPump (Ontool pump)
(4) GE 605-109114-001 CPU
(4) LAM RESEARCH 810-099175-103 VIOP
(4) LAM RESEARCH 605-707109-001 Engenuities
WATLOW 778-900046-701 Temperature controller
(3) WATLOW 778-900046-301 Temperature controllers
(3) LAM RESEARCH 810-495659-006 ESC Power supplies
(3) OCEAN OPTICS 685-801852-002 OES
MKS VDMB-23398 VODM
ASTEX AX2630NRC3-Q Microwave source
(3) LAM RESEARCH 839-019090-328 ESC
IGS Gas box
Gas line:
(3) Gas 12 HORIBA Z300
(3) Gas 11 LAM RESEARCH 797-026724-303
(3) Gas 10 HORIBA Z300
(3) Gas 9 LAM RESEARCH 797-026724-508
(3) Gas 8 HORIBA Z300
(3) Gas 7 LAM RESEARCH 797-026724-509
(3) Gas 6 HORIBA Z300
(3) Gas 5 HORIBA Z300
(4) Gas 4 HORIBA Z300
(3) Gas 3
(3) Gas 2 LAM RESEARCH 797-026724-525
(3) Gas1 LAM RESEARCH 797-0267724-624
(3) MKS 649A-25014 He UPC
UNIT UFC1661 O2
UNIT UFC1661 N2
(3) MKS E28B-23747 Process guages
HPS 109070019-CE TM vacuum guage
(2) HASTING HPM 2002 OBE Air lock vacuum guages
(3) ADIXEN ATH2300M Turbo pumps
(3) ADIXEN ATH2300M Turbo pump controllers
(4) ADIXEN ADS1202H PM Dry pumps
(3) RATCHETC BCU-E320F1 Chillers
(3) AE 660-024637-026 BIAS RF Generators
(3) AE 660-900984-008 TCP RF Generators
(3) LAM RESEARCH 848-801420-017 BIAS RF Matchers
(3) LAM RESEARCH 853-800120-112 TCP RF Matchers
(3) LAM RESEARCH 834-030822-025 BIAS RF Cables
(3) LAM RESEARCH 834-030819-018 TCP RF Cables.
LAM RESEARCH Kiyo is a high-efficiency, cost-effective etch/ash equipment ideal for semiconductor wafer manufacturing and other related applications. It is equipped with a highly efficient quartz-tube plasma source that facilitates etching at a rate four times faster than previous solutions with improved repeatability. Kiyo also offers the advantage of improved contamination control, thanks to its innovative design that requires minimal contamination conditioning. This enables it to reach extremely low levels of both process and particulate contamination. It also allows users to carry out multiple wafer processing steps with one system, resulting in significant cost savings due to reduced tool maintenance and cycle times. In addition to improved speed and quality of wafer processing, LAM RESEARCH Kiyo's intuitive user interface makes it easy for operators to program the unit for optimum performance, while its advanced safety features offer enhanced protection from hazardous materials. This machine is capable of achieving high etch rates with ultra-precise voltage and pressure control, as well as low temperature operation. Kiyo can be configured to process a wide range of materials, ranging from various metals, polymers, and silicides to the most difficult-to-etch materials such as silicon carbides and nitrides. Furthermore, it can be deployed seamlessly in production runs, thanks to features such as on-the-fly programmable recipes and automated recipe transfers. The tool also offers advanced monitoring and diagnostic capabilities, so users can quickly identify and correct errors. Overall, LAM RESEARCH Kiyo is an incredibly advanced etching asset that offers industry-leading capabilities at an affordable cost. Its intuitive graphical user interface simplifies training, and its unparalleled speed and quality makes it an ideal solution for organizations that require short production cycles and high-quality products.
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