Used LAM RESEARCH / ONTRAK 2300 Exelan Flex #9095926 for sale

LAM RESEARCH / ONTRAK 2300 Exelan Flex
ID: 9095926
Wafer Size: 8"
Vintage: 2005
Oxide etcher, 8", 2005 vintage.
LAM RESEARCH / ONTRAK 2300 Exelan Flex is an advanced etching/asching equipment for wafer fabrication and technology development. The combination of ONTRAK and LAM RESEARCH technology makes this system a powerful tool for etching, ashing, and cleaning processes. The Exelan Flex unit is designed to allow accurate, repeatable etching and ashing processes with shorter cycle times, while also providing a high level of process flexibility and reliability. The machine is equipped with two high-pressure ion chambers, allowing for automated high-pressure etching or ashing, or fine-tuning etching through gas pulse modulations. The pressure range is selectable from 100,000 to 1000 torr. The pressure of each chamber can be independently adjusted and monitored, allowing different processes to run simultaneously in the same tool. The asset can also be set up for dual-source vapor etching (DSV), combining a standard etching/ashing process with an atmospheric-pressure ashing process. The Exelan Flex features a broadband microwave excitation model for effective, high-energy etching or ashing. This equipment can operate in a wide frequency range of 1.3 to 13.4 GHz, providing the flexibility to tune and adjust the excitation according to process requirements. High-sensitivity thermal management system and Gas Repose Automatic Control (GRAC) are also included with the unit, allowing users to precisely control the temperature and gas flow in the chambers. The Exelan Flex is a highly integrated machine, reducing the need for additional components and providing a flexible, self-contained etching or ashing tool. LAM RESEARCH / ONTRAK and ONTRAK provide expert process design and asset integration services, allowing users to customize the model to their own specific requirements. All components used in the equipment are extensively tested to ensure quality and reliability, making it a reliable choice for high-precision etching and ashing processes.
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