Used LAM RESEARCH / ONTRAK 2300 Exelan Flex #9393139 for sale

LAM RESEARCH / ONTRAK 2300 Exelan Flex is an etcher/asher designed to provide high-speed patterning of flat and large dimensional substrates. It is most often used in the semiconductor industry for device fabrication. The etcher/asher utilizes inductively coupled RF energy and direct-write electron beam etching to achieve high throughput rates in the deposition and patterning of an array of materials. The equipment is also equipped with a microwave source and two plasma sources for performing thin oxide etching. In addition, this system is able to process aluminum up to 2.5 μm thick and aluminum oxide up to 5 μm thick. The unit's Work-in-Progress and Reel-to-Reel integration provides high throughput and power efficiency while its Inspection Monitor can be employed to inspect full printed wafers continuously without the need for mask and optical imaging. Furthermore, the Exelan Flex has a flexible reactor design that allows for easy access to each process chamber and a retractable top-loading machine for robust and efficient processing. The Exelan Flex is controlled by an operator-friendly PC-based software that offers the user a range of tools for configuring each process step with a touch of a button. In addition to regular instructions and program execution, the tool allows for manual control and setup of the process parameters and provides real-time monitoring of each chamber's process status. It also provides numerous self-diagnostic functions that continually monitor the equipment's performance. The Exelan Flex is also compatible with many popular CAD formats and boasts a modular design that enables it to be easily integrated into existing production lines and automate the entire process. It is a reliable and user-friendly etcher/asher that is well-suited to the patterning of a wide range of substrates, including silicon, glass, plastic, and metal alloys. Overall, ONTRAK 2300 Exelan Flex is an advanced, cost-effective etcher/asher which makes it an ideal choice for the semiconductor industry in need of high-speed patterning and deposition.