Used LAM RESEARCH / ONTRAK 2300 Kiyo45 #9255637 for sale

LAM RESEARCH / ONTRAK 2300 Kiyo45
ID: 9255637
Wafer Size: 12"
Vintage: 2011
Etcher, 12" 2011 vintage.
LAM RESEARCH / ONTRAK 2300 Kiyo45 is an etcher / asher equipment that is used for precision etching and ashing of integrated circuits. It is a highly reliable, advanced system that is designed for both process development and automated production applications. It is capable of achieving high uniformity with very low voiding levels. The unit consists of a vacuum chamber with two electrodes, a heater, a controller unit, and a gas injection machine. The gas injection tool is used to ensure a high etching rate and the chamber is equipped with special plasma cleaning systems that ensure a clean etching process. The chamber can accommodate wafers up to 8-inch, and the heater can range from -20° to 400+°C. The controller unit is able to control all parameters of the etch process, such as temperature, pressure, gas flow, etching time, and more. The asset is capable of etching a variety of materials such as silicon, silicon nitride, polysilicon, and more. It can also be used to etch through-silicon vias, or TSVs, to form 3-dimensional integrated circuits. The Kiyo45 features a 45nm etch depth and a 1-200nm etch resolution. It also has a vacuum rating from 10-7 torr to one torr. The model is able to provide highly uniform etching across the entire wafer and has a highly repeatable process. Its optional process monitoring equipment allows for real-time feedback of the etching process. It also comes with multiple safety features, such as multiple interlock areas and specialized scrubbing systems that are designed to protect the user from hazards. The Kiyo45 system is also an eco-friendly unit as it is compliant with all the applicable environment regulations. It does not require any hazardous chemical gases, and any hazardous particles produced during etching are quickly scrubbed away. Overall, ONTRAK 2300 Kiyo45 is a reliable and highly versatile etcher/asher machine that is ideal for precision etching of integrated circuits, and other photolithographic processes. It is well suited for both process development and automated production operations, and it is eco-friendly.
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