Used LAM RESEARCH / ONTRAK 2300 Kiyo45 #9407034 for sale

LAM RESEARCH / ONTRAK 2300 Kiyo45 is a precision-engineering laser ablation equipment that is used in a variety of advanced etching and ashing processes. It is specifically designed to provide the most precise surface treatment of a wide range of industrial-grade substrates. The product is ideal for use in microfabrication and nanofabrication processes, and features advanced features such as laser etching and laser-reactive-vapor surface treatment. The system is designed for the highest level of performance and precision, with a state-of-the-art design that allows for superior accuracy in both etch and ash processes. The unit features a powerful laser operating at 1030 nm wavelength, and is capable of a range of pulse energies of 0.2 to 500 mJ/pulse. This powerful laser makes the machine ideal for both deep etching and fine structure surface processes. The laser is coupled to the tool with a 12.3 inch stage for precise sample positioning, and an advanced control asset that allows users to easily control the laser and process parameters. The model also features a 40 nanosecond pulse width and a 3 millimeter touch-triggering window, making it ideal for advanced etching and ashing processes. The equipment is capable of processing materials at temperatures up to 278°C, offering superior flexibility in the process. The system is also fitted with safety features such as interlock, to ensure the safety of the operator. In addition, the unit includes a range of advanced components, all of which provide intuitive and easy operation, while also delivering optimal performance. These components include a 3000 - 10000 rpm precision metering pump, air cooling machine, ashing table, ashing chamber, fume exhaust tool, cooling fans, and a range of other features. Overall, ONTRAK 2300 Kiyo45 is an advanced etching and ashing asset, designed to offer the precision and performance required for the most demanding etching and ashing applications. Its powerful laser and advanced features, coupled with the superior accuracy of its stage and control model, allow users to deliver superior performance, ensuring a cost-effective solution for almost any application.