Used LAM RESEARCH / ONTRAK Kiyo 45 #293589528 for sale

LAM RESEARCH / ONTRAK Kiyo 45 is an etcher/ashers designed for precision wet etching of high-value substrates such as III-V components, ultra-thin wafers, and silicon Integrated Circuits (IC's). This state-of-the-art etcher/ashers provide a solution for re-engineering and modifying top-down features of existing products and realize the potential of advanced device architectures. ONTRAK Kiyo 45 is composed of two major components - the Process Chamber and the Control Equipment. The Process Chamber is a precisely-manufactured stainless steel enclosure containing the excitation sources and thermal zones, and utilizing re-circulated etching solution. Its design features include a stainless steel enclosure that meets high-performance vacuum demands, a suspended weight system to minimize vibration and a base plate optimized for maximum temperature uniformity. The high performance waterjet plume, generated by the dual excitation sources, produces perfectly aligned and repeatable feature geometries with low-temperature processing capability for damage-prone integrated circuit (IC) materials. LAM RESEARCH Kiyo 45's Control Unit is comprised of a high-performance, embedded automation engine, real-time monitor, and safety interlock machine. The tool offers full control over the etching process from A to Z including profile and one-step process set-up, real-time process monitoring and control, asset- and hardware-level interlocks for protection, and several advanced process recipes for the etching of high-value substrates. The user-friendly graphical interface enables easy access to the process parameters, displays the process process status in real-time and provides full-diagnostics of all process parameters. Kiyo 45 is CE compliant, fully automated and requires minimal operator intervention which ensures repeatability and process reproducibility. The etcher can be effectively used for high-precision re-engineering and modification of existing components, and realizing device architectures that require deep features. LAM RESEARCH / ONTRAK Kiyo 45 also offers a safety interlock model and embedded monitoring and controlling features which help ensure consistent, high-quality results. Moreover, it can also be effectively used for various application such as trench etching, wafer thinning, photomask repair and reliable MEMS device fabrication.