Used LAM RESEARCH / ONTRAK Kiyo 45 #9098962 for sale

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ID: 9098962
Poly etcher, 12" Signal tower: (3) Colors SMIF(EFEM) (3) Poly etch chambers (1) MWAVE STRPR (3) Load ports (1) ATM Robot (1) Buffer station (25) Slots (1) Aligner (2) Load locks (4) Slot cool chamber Megatran7 / Broooks transfer robot Etch chamber TM Pressure gauge: HPS Series907 / MKS TM Pressure control: MKS Series640 LL Pressure gauge: Hasting Model of chamber: 2300 Metal Model of pressure gauge: MKS, 0.1Torr Model of throttle gate valve: 65048-PH52-ADR1 / VAT Model of turbo pump: STP-XA2703CV/Edwards Model of TCP RF generator: APEX1513 / AE Model of bias RF generator: APEX1513 / AE MW Chamber Model of chamber: 2300 MWAVE STRPR Model of throttle gate valve: MKA, 253B-24836 Model of vaporizer: MKS, VODMB33CRIBE Model of MW generator: Revolution, 7690LAM-23 configuration of MFC: Ar 2SLM, O2 5SLM, N2 1SLM Configuration of gas panel, etch chamber Type of gas panel: 16-Line IGS block (16) Gas channel Model of MFC: SEC-Z313M Configuration of gas: CF4 50sccm O2 20sccm CL2 200sccm CH2F2 50sccm HBr 500sccm He 500sccm O2 200sccm H2 100sccm SF6 10sccm Ar 500sccm HBr 50 sccm C2F6 200sccm CF4 200sccm SF6 200sccm N2 100sccm CHF6 200sccm Configuration of AC rack: 208VAC 3ph (4) Wires 400 AMPS 50/60Hz Missing parts: Load ports 2007 vintage.
LAM RESEARCH / ONTRAK Kiyo 45 Etcher/Asher is a piece of hardware designed to etch or deposit thin films on a substrate. The unit is a single-chamber, single-wafer equipment that uses plasma source technology to achieve superior etching and ashing results. It is capable of handling a variety of wafer sizes, from 2" (50 mm) to 8" (203.2 mm) in diameter. The process chamber is a sealed stainless steel enclosure fitted with a quartz top wall. This allows quick heating and cooling, and ensures compatibility with corrosive and hazardous materials. The chamber has a unique, dual-plate design that allows for better process isolation and control. It is also equipped with sophisticated pressure transducers to maintain process integrity and yield. ONTRAK Kiyo 45 also offers an advanced plasma source technology that produces a wide range of power levels and process recipe flexibility. It allows for simultaneous etching and ashing with no substrate damage, and offers ultra-thin film etching and deposition, as well as directional and anisotropic etching. The unit is also equipped with a robust vacuum system, allowing for rapid evacuation and optimized process times. LAM RESEARCH Kiyo 45 boasts a high level of automation and operator control. It offers an intuitive graphical user interface (GUI) and full-featured data management capabilities. It provides advanced process monitoring and tracking, as well as detailed recipe recall and repeatability. When coupled with a compatible ONTRAK process kit, Kiyo 45 offers a complete etching and ashing solution. This includes a power supply, a gas delivery unit, a visual machine, an RF tool, an electronics cabinet, and additional accessories. With its powerful combination of hardware and software, LAM RESEARCH / ONTRAK Kiyo 45 can etch and deposit thin films to achieve superior results.
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