Used LAM RESEARCH / ONTRAK Kiyo 45 #9098962 for sale
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ID: 9098962
Poly etcher, 12"
Signal tower: (3) Colors
SMIF(EFEM)
(3) Poly etch chambers
(1) MWAVE STRPR
(3) Load ports
(1) ATM Robot
(1) Buffer station
(25) Slots
(1) Aligner
(2) Load locks
(4) Slot cool chamber
Megatran7 / Broooks transfer robot
Etch chamber
TM Pressure gauge: HPS Series907 / MKS
TM Pressure control: MKS Series640
LL Pressure gauge: Hasting
Model of chamber: 2300 Metal
Model of pressure gauge: MKS, 0.1Torr
Model of throttle gate valve: 65048-PH52-ADR1 / VAT
Model of turbo pump: STP-XA2703CV/Edwards
Model of TCP RF generator: APEX1513 / AE
Model of bias RF generator: APEX1513 / AE
MW Chamber
Model of chamber: 2300 MWAVE STRPR
Model of throttle gate valve: MKA, 253B-24836
Model of vaporizer: MKS, VODMB33CRIBE
Model of MW generator: Revolution, 7690LAM-23
configuration of MFC: Ar 2SLM, O2 5SLM, N2 1SLM
Configuration of gas panel, etch chamber
Type of gas panel: 16-Line IGS block
(16) Gas channel
Model of MFC: SEC-Z313M
Configuration of gas:
CF4 50sccm
O2 20sccm
CL2 200sccm
CH2F2 50sccm
HBr 500sccm
He 500sccm
O2 200sccm
H2 100sccm
SF6 10sccm
Ar 500sccm
HBr 50 sccm
C2F6 200sccm
CF4 200sccm
SF6 200sccm
N2 100sccm
CHF6 200sccm
Configuration of AC rack:
208VAC 3ph (4) Wires 400 AMPS 50/60Hz
Missing parts: Load ports
2007 vintage.
LAM RESEARCH / ONTRAK Kiyo 45 Etcher/Asher is a piece of hardware designed to etch or deposit thin films on a substrate. The unit is a single-chamber, single-wafer equipment that uses plasma source technology to achieve superior etching and ashing results. It is capable of handling a variety of wafer sizes, from 2" (50 mm) to 8" (203.2 mm) in diameter. The process chamber is a sealed stainless steel enclosure fitted with a quartz top wall. This allows quick heating and cooling, and ensures compatibility with corrosive and hazardous materials. The chamber has a unique, dual-plate design that allows for better process isolation and control. It is also equipped with sophisticated pressure transducers to maintain process integrity and yield. ONTRAK Kiyo 45 also offers an advanced plasma source technology that produces a wide range of power levels and process recipe flexibility. It allows for simultaneous etching and ashing with no substrate damage, and offers ultra-thin film etching and deposition, as well as directional and anisotropic etching. The unit is also equipped with a robust vacuum system, allowing for rapid evacuation and optimized process times. LAM RESEARCH Kiyo 45 boasts a high level of automation and operator control. It offers an intuitive graphical user interface (GUI) and full-featured data management capabilities. It provides advanced process monitoring and tracking, as well as detailed recipe recall and repeatability. When coupled with a compatible ONTRAK process kit, Kiyo 45 offers a complete etching and ashing solution. This includes a power supply, a gas delivery unit, a visual machine, an RF tool, an electronics cabinet, and additional accessories. With its powerful combination of hardware and software, LAM RESEARCH / ONTRAK Kiyo 45 can etch and deposit thin films to achieve superior results.
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