Used LAM RESEARCH / ONTRAK Kiyo 45 #9298318 for sale

LAM RESEARCH / ONTRAK Kiyo 45
ID: 9298318
Vintage: 2012
System 2012 vintage.
LAM RESEARCH / ONTRAK Kiyo 45 is an etcher/asher designed for applications in the semiconductor industry. It is suitable for etching thin films of a range of materials, including silicon, copper, and aluminum, for semiconductor device fabrication. ONTRAK Kiyo 45 features a high capacity of up to 4,500 wafers per hour, making it one of the most efficient etchers available on the market. The equipment utilizes an ultra-low-pressure technology that delivers excellent etch rate uniformity. A vertical profile is generated by controlling the etch rate up and down, and LAM RESEARCH Kiyo 45's in-situ RIE system allows the user to etch multiple layers simultaneously, significantly reducing etching cycle times. Kiyo 45 also uses a patented Constant Pressure etching technology (CPET) that ensures consistent etch rates regardless of unit changes, thus providing excellent uniformity in market-leading step coverage and feature profile control. In addition, LAM RESEARCH / ONTRAK Kiyo 45 is equipped with a high resolution image viewer, as well as a high resolution optical emission spectroscopy machine (OES). The OES tool provides real-time process monitoring and control, enabling the user to monitor the progress of etching processes. Furthermore, ONTRAK Kiyo 45 has a gas flow control asset which allows the user to precisely control the parameters of the etching process to ensure optimal results. LAM RESEARCH Kiyo 45 also features an air-cooled chamber construction, which helps ensure a safe, clean, and reliable operation. The model meets the industry's highest performance requirements as it is constructed from an advanced materials equipment (AMS). Kiyo 45 is also equipped with a range of advanced safety features, such as a remote operation system, automated safety feature, and programmable process parameters. Overall, LAM RESEARCH / ONTRAK Kiyo 45 is an advanced etcher/asher designed to fulfill the needs of the most demanding etching and ashing requirements in the semiconductor industry. Its advanced AIR COOLED construction, ultra-low-pressure technology, and high-resolution image viewing capabilities make it an essential tool in any semiconductor manufacturing facility.
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