Used LAM RESEARCH / ONTRAK Kiyo 45 #9298320 for sale

LAM RESEARCH / ONTRAK Kiyo 45 is a reactive ion etcher (RIE) designed for the controlled etching of semiconductor materials. It is capable of high aspect ratio etching with precise control of profile, through its powerful plasma generator and vacuum pumping system. ONTRAK Kiyo 45 is equipped with a single, adjustable, multi-axis electrode for precision control over etch profile and etch rate. The etch chamber is constructed of stainless steel and is designed to withstand the high vacuum and thermal cycling of the plasma etching process. LAM RESEARCH Kiyo 45 employs a reaction chamber equipped with an inductively coupled plasma generator. The plasma generator produces a high-energy, low-vacuum, plasma environment, which allows the formation of a reactive species necessary for etching with excellent selectivity and high through-thickness rate of etch. Kiyo 45 is equipped with the plasma generator, vacuum pump, and power supplies, allowing the etching process to be run in several standard cooking modes, including single-step and multiple-step recipes. LAM RESEARCH / ONTRAK Kiyo 45 can be operated to etch single-layer or multi-layer substrates in several standard etch chemistries such as trifluoroethanol (TFE) and three fluorinated hydrocarbons (TFE, CF4 and SF6). ONTRAK Kiyo 45 also allows for custom, optimized etch recipes to be programmed by its users for more complex etch processes. It is capable of both wet and dry clean processes, allowing for high-degree of chamber cleanliness and reduced background contamination. At the heart of LAM RESEARCH Kiyo 45 is its well-proven Multi-Axis Electrode (MAE) design. The MAE is a proprietary feature of Kiyo 45 which is optimized for fast, highly anisotropic, fine line etch patterning of demanding semiconductor substrates. The MAE is a fully tunable electrode that provides precision etch control and features adjustable electrodes to enable higher aspect ratios and more complex etch patterning. LAM RESEARCH / ONTRAK Kiyo 45 has a total process flexibility and is designed for operation in a flexible environment. It is highly automated and supports various data collection, analysis, and logging features for complete process traceability. ONTRAK Kiyo 45 is also equipped with a user-friendly Graphical User Interface (GUI) for process control and monitoring. In summary, LAM RESEARCH Kiyo 45 is designed for precision etching of demanding semiconductor materials with excellent selectivity and high etch rate in both dry and wet etch chemistries. Its advanced Multi-Axis Electrode (MAE) and plasma generator systems enable highly anisotropic, fine line etch patterning with adjustable electrodes, allowing for high aspect ratios and complex etch patterning. Kiyo 45's user-friendly Graphical User Interface (GUI) and process flexibility make it an excellent choice for etching of demanding semiconductor material.