Used LAM RESEARCH / ONTRAK Kiyo 45 #9311233 for sale

LAM RESEARCH / ONTRAK Kiyo 45 is an etcher/ashier that is designed for use in photolithography, photoresist, wafer fabrication and other semiconductor manufacturing. This etcher/ashier provides superior process control for the development of patterns on substrates. This equipment is capable of delivering precise, repeatable etching and ashing results with optimal etchant usage. It is cost-effective and easy to use, and can be quickly setup and operated with minimal training. ONTRAK Kiyo 45 features a four chamber design, including a dedicated pre-etch, etchant, ash, and rinse chambers. The pre-etch chamber allows for the uniform application of a dry film of photoresist to a substrate, while the etchant chamber serves to etch away excess photoresist material once exposed to a particular pattern. The ash chamber removes ashing residues, and finally, the rinse chamber cleans and floods the substrate to prepare it for the next step. LAM RESEARCH Kiyo 45 also includes unique software features to help support the overall etching and ashing process. The equipment has built-in 3D data acquisition and analysis software to allow for precise pattern recognition and repeatable etching/ashing operation. It also comes with job scheduling, recipe remapping, automated etching/ashing optimization and job monitoring capabilities. The software system is highly user-friendly and designed to make the entire unit easier to use and manage. Kiyo 45 also provides multiple physical and chemical configurations to suit various process requirements. It comes with sophisticated process controllers, gas delivery systems, and parabolic antennas. Its advanced gas delivery systems offer reliable performance and precision control over etching/ashing gas flow. Lastly, its parabolic antennas provide a temperature-controlled environment for precise etchant application. In conclusion, LAM RESEARCH / ONTRAK Kiyo 45 is an advanced etcher/ashier designed to provide excellent performance and accurate results. It is well suited for a wide range of process applications, from photolithography to wafer fabrication. The machine's precise and repeatable etching/ashing capabilities, user-friendly software suite, and advanced physical and chemical configurations make it ideal for semiconductor manufacturing.