Used LAM RESEARCH / ONTRAK Kiyo 45 #9314595 for sale

LAM RESEARCH / ONTRAK Kiyo 45 is an automated etcher/asher capable of plasma etching and etching precision. It is used in the microelectronics industry to create micro-scale components and devices, such as multi-layer chips or quantum computing components. ONTRAK Kiyo 45 is designed with a dual-zone vacuum chamber and is capable of complete end point detection. It is equipped with an in-situ wafer temperature mechanism, providing an accurate and uniform temperature for the etching process. LAM RESEARCH Kiyo 45 also features a remotely adjustable reaction chamber, which provides flexibility in controlling the etching parameters. The chamber's walls are constructed from high-grade alloys, ensuring it is corrosion resistant and can withstand the harsh etching process. Additionally, the etcher is equipped with a turbo pump and shaft-driven gate valve that features a patented motor-less design. This allows the user to control the rates of deposition and sputtering, and to minimize the time required for wafer processing. Kiyo 45 is powered by an advanced two-channel electronic controller, with an intuitive interface, and provides comprehensive process control for its users. It is equipped with a variety of diagnostic functions such as end point determination, self-diagnosis of plasma parameters, and a wide range of control of gas and source delivery. Additionally, LAM RESEARCH / ONTRAK Kiyo 45 features process simulations, allowing the user to predict the outcome of a process prior to its commencement. ONTRAK Kiyo 45 is able to accommodate multiple wafer sizes, including small wafers as well as large wafers up to eight inches in diameter. It is capable of processing up to two 8" wafers simultaneously with the integrated load lock chamber. The etcher also has the capability of multi-slice etching, allowing for more efficient production of complex structures. In summary, LAM RESEARCH Kiyo 45 is an automated etcher/asher equipped with advanced features for precise etching and deposition of fine micro-scale devices. It has a dual-zone vacuum chamber, in-situ wafer temperature mechanism, adjustable reaction chamber, and electronic controller with an intuitive interface. Kiyo 45 is also capable of processing multiple wafer sizes and is equipped with process simulations for accurate prediction of process results.