Used LAM RESEARCH / ONTRAK Kiyo 45 #9315260 for sale

LAM RESEARCH / ONTRAK Kiyo 45 is an etcher/asher designed to provide precision performance for high temperatures substrate processing. This equipment is used in the semiconductor industry to etch and remove photoresist from a variety of wafers and substrates. ONTRAK Kiyo 45 utilizes a proprietary multi-chamber gas diffusion chamber technology, along with a high-precision gas feed mechanism, to better control the etching process. LAM RESEARCH Kiyo 45′s gas diffusion chamber is specially designed to maximize gas dissolution and uniformity during etching processes, thus enabling precise control of target etch rates. The small size of the chamber also allows a precise control of the etching rate at high temperatures. This high temperature capability is useful for etching high-K dielectric material such as hafnium dioxide, aluminum oxide or silicon oxynitride layers which require etching temperatures above 650℃. Kiyo 45 also features precise temperature regulation that can be set to within +/-1℃, providing accurate temperature stability during etching. The system has an integrated wash station, which helps to further reduce process residue during the etch cycle. The latest versions of LAM RESEARCH / ONTRAK Kiyo 45 also provide fully automated etching cycles for precise substrate processing. The etching gases used in ONTRAK Kiyo 45 etcher are typically CF4, CHF3, O2, or ArF, depending on the material being etched. An optional remote monitor of the unit is available, allowing users to access a wide range of machine recipes and operational data from any web-enabled device. Overall, LAM RESEARCH Kiyo 45 etcher/asher is capable of precise substrate processing, precise temperature regulation and advanced etching control which is ideal for high temperature substrate applications. With automated etch cycles and the ability to access a wide variety of recipes and operational data remotely, it is an efficient tool for etching and ashing photoresist materials.