Used LAM RESEARCH / ONTRAK Kiyo 45 #9358668 for sale

LAM RESEARCH / ONTRAK Kiyo 45
ID: 9358668
Vintage: 2011
Etcher 2011 vintage.
The LAMLAM RESEARCH / ONTRAK Kiyo 45 is an etcher/asher, part of the Kiyo series of standalone and automated wet etch systems. This precision microfabrication equipment is used to create features down to 0.75 μm, and is designed to meet the needs of advanced research, development, and laboratory applications. This system provides high-accuracy etching with a wide etch range and reliable performance, and is capable of handling silicon, sapphire, quartz, polymers, and other materials. ONTRAK Kiyo 45 unit utilizes a zero-flux isolation chamber to create a highly-controlled chemical environment within the chamber for etching. This chamber is designed to maintain a static environment and minimize exposure to contamination while etching. LAM RESEARCH Kiyo 45 also features a re-circulation loop to provide consistent temperatures and reduce chemical waste. Additionally, Kiyo 45 includes a recirculating process tank with digital temperature control and independent temperature and chemical concentration monitoring, as well as an automated wafer and boat cassette loading machine. LAM RESEARCH / ONTRAK Kiyo 45 is capable of handling up to 4" wafers and has an etch rate up to 4 μm/min. The tool is also equipped with a programmable recipe asset that allows for the easy customization of etching processes, and features an automatic timing timer and pump control model that allows for repeatable etching operations. The controller also features an operator interface with display and a range of control options for etch process development and optimization. ONTRAK Kiyo 45 is easy to install and operate, and provides accurate and repeatable etching results. It is designed to operate reliably and efficiently, and with a low consumption of chemical and power. LAM RESEARCH Kiyo 45 also provides an ideal platform for microfabrication research, and is easily integrated into existing research facilities, allowing for faster process development and improved performance.
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