Used LAM RESEARCH / ONTRAK Kiyo 45 #9358691 for sale

LAM RESEARCH / ONTRAK Kiyo 45 is an etcher or asher used for plasma etching and ashing of thin films and coatings. The etcher offers precise, repeatable, and high throughput etching or ashing with a powerful RF power output that is capable of producing independent and simultaneous high quality etching or ashing with no ion bombardment on the substrate surface. ONTRAK Kiyo 45 etcher has a modular design which allows for an easy integration into a system. The etcher is a dual-pressure, ambient-temperature etcher with two independent plasma sources; one source for etching and one source for ashing. This allows for precise etching and ashing of samples by providing an isolated and individual environment for both processes. The etcher is equipped with an independent RF generator for each process to ensure optimal etch and ashing performance. The etcher also has an automated in-line gas control system for etching and ashing processes. LAM RESEARCH Kiyo 45 etcher is equipped with an up-flow, multi-zone processing chamber that is specifically designed to optimize the etch rate uniformity of larger substrates with a wide range of etch chemistries and etch conditions. The etcher is also compatible with a wide range of etch chemistries which allows for a wide range of etch processes on a variety of materials. Kiyo 45 etcher is equipped with advanced safety features to ensure that all processes are performed in a safe and secure environment. The etcher is equipped with a built-in plenum for atmosphere filtration, a HEPA filter to ensure healthy working conditions, and stainless steel construction to ensure long-term durability. The etcher also has an advanced monitor and control system to allow for accurate monitoring of the substrate etch and ashing processing. LAM RESEARCH / ONTRAK Kiyo 45 etcher is a powerful and versatile etcher or asher that can meet a wide range of etching and ashing demands, allowing for long-term reliability and high performance. This etcher is the perfect choice for etching thin films and coatings with precise, repeatable, and high throughput performance.