Used LAM RESEARCH / ONTRAK Kiyo 45 #9358695 for sale

LAM RESEARCH / ONTRAK Kiyo 45
ID: 9358695
Vintage: 2003
Etcher 2003 vintage.
LAM RESEARCH / ONTRAK Kiyo 45 is a powerful etching and ashing equipment designed for the mass production of extremely fine micro-structures. Utilizing state-of-the-art etching and ashing technology, ONTRAK Kiyo 45 enables production of a very high degree of accuracy and micro-detail resolution. Additionally, due to its low temperature range and ease of maintenance, it is well suited for use in a wide range of industrial fabrication processes. LAM RESEARCH Kiyo 45 is capable of delivering precise, highly uniform layer thicknesses of materials such as silicon, nitride, silicon dioxide and aluminum. This system is capable of operating in both batch and single wafer processing modes and provides reliable etching processes even at very high levels of material removal. The etching and ashing is strongly driven by the reaction of the chosen etchant gas, either CF4 or SF6, and is designed for easy-to-use single wafer mode operation. With its unique design, Kiyo 45 incorporates a variety of features that make it extremely efficient for batch processing. Its open-ended unit makes it easy to access the substrate and produce thermal stable, precise, uniform etching with superior edge definitions. Additionally, the machine utilizes a multi-source plasma which gives it the capability to convert inert gas to active species for ashing that is faster and more uniform than what other systems are capable of. LAM RESEARCH / ONTRAK Kiyo 45 also has the ability to provide fast, repeatable, reliable results, even at very high-throughputs. ONTRAK Kiyo 45 is also designed for easy and relatively low maintenance. With features such as the easy open chamber, auto-refill programs for gas and supplies, and the reliable and precise in situ mass flow controllers, LAM RESEARCH Kiyo 45 makes it easy to keep the tool running efficiently. In conclusion, Kiyo 45 is a powerful etching and ashing asset designed for mass production of micro-structures. It provides precise etching and ashing even at very high-throughputs, with great accuracy and resolution. Furthermore, it is designed for easy and low-maintenance operation, making it an ideal choice for industrial fabrication and many other processes.
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