Used LAM RESEARCH / ONTRAK Kiyo 45 #9375193 for sale
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ID: 9375193
Vintage: 2007
Metal etcher
(2) Chambers (PM2, 3)
With (2) Strips (PM1, 4)
MF (EFEM/TM):
Platform type: V2
(3) BROOKS 002-7200-32 Load ports
BROOKS 138150 ATM Robot
BROOKS 401600-201-0002-FRU TM Robot
EDWARDS EPX180N IPump (Ontool pump)
PM Module (PM1,2,3,4):
(3) MOTORORA CPU
(2) LAM RESEARCH 810-046015-009 VIOP
(2) LAM RESEARCH 810-099175-103 VIOP
(2) LAM RESEARCH 605-707109-001 Engenuities
(2) LAM RESEARCH 605-707109-012 Engenuities
(3) LAM RESEARCH 810-495659-303 ESC Power supplies
OCEAN OPTICS 685-801852-005 OES
OCEAN OPTICS 685-069171-002 OES
MKS 797-004456-003 VODM
MKS 797-00456R005 VODM
(2) MKS AX7695 Revolution
(2) LAM RESEARCH 839-014090-374 ESC
Gas configuration:
IGS Gas box
(17) Gas lines
(20) HORIBA SEC-Z313M Gas box MFC
(3) HORIBA SEC-Z719MGX Gas box MFC
(9) HORIBA D219-SCT Gas box MFC
(2) MKS 649A-25014 He UPC
Strip gas:
(2) HORIBA SEC-Z313M Gas 3 Ar(2000)
(2) HORIBA SEC-Z313M Gas 2 O2(5000)
(2) HORIBA SEC-Z313M Gas 1 N2(1000)
Components:
(2) MKS E28B-23747, 31802 Process gauges
(2) MKS 625A-14059 Chamber gauges
HPS 109070019-CE TM vacuum gauge
(2) TELEDYNE HPM2002-OBE-LM Air lock vacuum gauges
(2) EDWARD STP-XA2703CV Turbo pumps
(2) EDWARD SCU-1500 Turbo pump controllers
RF Gen / Matcher:
APEX APEX1513 BIAS RF Generator
APEX PARAMOUNT1513 BIAS RF Generator
APEX APEX1513 TCP RF Generators
APEX APEX2013 TCP RF Generators
LAM RESEARCH 832-038915-001 BIAS RF Matcher
LAM RESEARCH 832-038915-203 BIAS RF Matcher
LAM RESEARCH 853-034908-200 TCP RF Matcher
LAM RESEARCH 853-043759-401 TCP RF Matcher
LAM RESEARCH 834-036619-011 BIAS RF Cable
LAM RESEARCH 684-111962-001 BIAS RF Cable
LAM RESEARCH 834-036619-020 TCP RF Cable
LAM RESEARCH 834-036619-021 TCP RF Cable
2007 vintage.
LAM RESEARCH / ONTRAK Kiyo 45 is a powerful etcher/asher for substrates. It is designed as a single-wafer tool, allowing for precise and accurate etching and ashing processes in routine wafer fabrication. It is equipped with a highly efficient dual-source, multi-zone radio-frequency (RF) source which enables simultaneous, low-temperature ashing and high-temperature etching. This allows for excellent uniformity and repeatability across all lithographic processes. The tool also provides excellent repeatability of the pattern on the wafer across a variety of substrates. ONTRAK Kiyo 45 has a sophisticated plasma process control equipment which allows for precise tuning and uniformity across the wafer. It operates with an advanced shutter system which improves process control and allows for efficient wafer transfer. The tool also has an Optical Emission Spectrometer (OES) which provides real-time monitoring of plasma parameters, allowing for real-time tuning of the etching and ashing processes. LAM RESEARCH Kiyo 45 is constructed from high-grade stainless steel and aluminum alloys, and has a highly efficient cooling unit, allowing for low temperatures during etching and ashing. The tool utilizes the latest high-performance Turbo Pump Vacuum technology with excellent pumping rates and low noise levels. It also features a 3-bar outlet RF power supply and a separate, variable frequency, low-frequency power supply. Kiyo 45 has a PC-based control machine with a modern GUI, allowing for remote control and monitoring. The tool provides process parameters such as chamber pressure, RF power, gas flows and temperatures. It also features advanced monitoring and diagnostics functions as well as asset safety alarms. LAM RESEARCH / ONTRAK Kiyo 45 is designed for optimal productivity and repeatability for etching and ashing processes. It is a reliable and powerful tool for any lithography application. With its robust construction and cutting-edge technology, it can provide optimal results even with more challenging materials.
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