Used LAM RESEARCH / ONTRAK TCP 9400 SE #9134000 for sale
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ID: 9134000
Etcher, 8"
SMIF
General Configuration:
TCP 9400 Stand alone
Bulkhead
Hepa present: Yes
Indexer type: Standard, hine 38A
Control system classic or envision: Classic
Remote AC box: Yes
Chiller: RISSHI EX-1000 (l)
SMIF: LPT2200 (2)
TCP Generator: 660-024637-006, AE RFDS
Bias generator: 660-024637-003, AE RFG1250
Microwave: No
DSQ: No
Hinged DSQ: No
DSQ / MW Generator: No
Generators: No
Top match: Yes
Bottom match: Yes
Variable gap: No
Fixed gap: Yes
ESC: Yes
Clamped system: No
Backside He UPC: UNIT 50sccm UPC-1300
Backside He manometer: 853-017643-003,Tylan
Upgraded variable gap: No
VAT64: Yes; VAT valve system
VAT65: No
Turbo type: SEIKO SEIKI STP-H1000L
Endpoint detector type: 853-001983-005; 405/520um
Heated endpoint windows: Yes
Anafaze type: Yes
Gas box unit or orbital: Vertial
MFC #1: CI2-200 sccm; Area FC-780C
MFC #2: CF4-200 sccm; Area FC-770AC
MFC #3: 02-10 sccm: Area FC-780C
MFC #4: He-200 sccm: Area FC-770AC
MFC #5: HBr-200 sccm: Area FC-780C
MFC #6: SF6-200 sccm: Area FC-770AC
MFC #7: 02-200 sccm: Area FC-770AC
MFC #8: S02-100 sccm: Area FC-780C
MFC #10: No
MFC #11: No
MFC #12: No
WVDS: No
Autofill WVDS: No
Backside He regulator: No
Chamber manometer: Millipore CMH4-MllS19E; 0.1torr
Trubo manameter: 853-031540-001: MKS 625A11TDE; 10torr
Pumping line manameter: MKS 625AllTDE;10torr
Heartbeat PCB: 810-017012-002
Turbo / Controller: Yes
Turbo heaters: Yes
Bulkhead or ballroom components: Yes
Covers: Yes
Indexers: Yes
ELL: Yes
Chamber: Yes
VAT Assy and controller: Yes
XLL: Yes
Gas box: Yes
AC / DC box: Yes
Control enclosure: Yes
Upper match enclosure: Yes
Lower match enclosure: Yes
Calibration tool: Yes
Chamber parts: Yes (1) set
User manual: Yes
Pressure control: Yes
Cables arid harnessing:
Chiller signal interface cable: Yes
Chiller EMO cable: Yes
Chiller power cable: Yes
Generator signal interface cable: Yes
Generator EMO cable: Yes
Generator power cable: Yes
Remote AC box EMO cable: Yes
Etcher power cable: Yes
1996 vintage.
LAM RESEARCH / ONTRAK TCP 9400 SE is an advanced etching and ashing equipment designed to produce uniform and reproducible results by utilizing state-of-the-art technologies. This system is especially well-suited for etching and ashing processes involving the production of thin films, such as semiconductor devices. ONTRAK TCP 9400 SE utilizes a radio frequency (RF) generator to supply the necessary power for etching and ashing operations. This RF generator is controlled by a computer, allowing for precise control over the power and speed levels of the etching operation. In addition, LAM RESEARCH TCP 9400 SE is equipped with advanced feedback sensors that can monitor the etch rate and uniformity in real time, allowing for precise control of the etching process. The etching and ashing unit also includes a vacuum chamber, which facilitates the process by providing a controlled environment free from contaminants and other airborne particles that could compromise the process. The chamber also helps to maintain constant processing conditions and helps to eliminate contamination of the substrate. TCP 9400 SE has several built-in safety features that provide an extra layer of protection for users, such as an emergency stop switch that can be activated if the process is not behaving as expected. It also comes equipped with a temperature and humidity control machine to ensure consistent temperatures and humidity levels that are necessary for successful etching and ashing operations. The tool also includes a robust cooling asset that helps to ensure that the etching and ashing operation is performed without any overheating of the substrate. This cooling model is equipped with multiple temperature sensors which allow the controller to maintain a consistent temperature for the process. Finally, LAM RESEARCH / ONTRAK TCP 9400 SE is equipped with an advanced RF feed aspect which allows for accurate trace and cross section voltage measurements, allowing for more precise control of the etching process. In all, ONTRAK TCP 9400 SE provides all the essential features necessary for successful etching and ashing processes. With its advanced RF generator, vacuum chamber, safety features, cooling equipment, and RF feed aspect, this machine is a powerful and reliable tool for producing uniform and reproducible results in etching and ashing processes.
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