Used LAM RESEARCH Rainbow 4400 #293814660 for sale
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ID: 293814660
Etchers
(2) Load stations
(2) Robot arms
(5) ADIO
(2) Mini matches
(2) Upper and lower chamber cooling waters
(6) Gas Lines and MFC (Mass Flow Controllers)
CPU
PCB
SIO
Brake
Gap motor
AC-2 Controller
Control board
Endpoint detector
Load point and shuttle
Chamber heating relay
Heartbeat and mother PCB
Gas panel and interlock
Upper and lower electrodes
BAF Gas distribution plate
Lower chamber ceramic ring
Upper chamber gas line
Manometer (10 Torr)
Throttle valve
He Cooling
Power Supply: 24V, 5V/±15V, 5V/±12V.
LAM RESEARCH Rainbow 4400 is a production class Etch/Asher equipment built for advanced processing of substrates and thin film materials. This dynamic machine is engineered to process a variety of substrates, ranging from silicon and other III-V compounds to metals, ceramics and other dielectrics. It is designed to yield an array of process results in a clean environment, such as etching, thin film deposition, or wet processing. This advanced technology provides flexibility and scalability for research and production operations. Rainbow 4400 is equipped with a range of process technologies, such as a dual source plasma source for etching, multiple gas delivery systems for both etch and deposition processes, and precision wafer handling to minimize particle generation. This system also features an advanced chamber evacuation unit, allowing for rapid process changes and improved process repeatability. LAM RESEARCH Rainbow 4400 is capable of advanced substrate patterning thanks to its sophisticated ion beam imaging capabilities, which include high resolution spot shapes, accurate and repeatable dose-over-field, and low total ion bombardment noise. Rainbow 4400 features a state-of-the-art electronic control machine and a comprehensive software suite. This control tool enables full integration with the process chamber, allowing the operator to manage multiple process chambers simultaneously. The software suite allows users to customize their recipes and offers advanced data logging capabilities to increase process optimization. A key feature of LAM RESEARCH Rainbow 4400 is its unique dual-source plasma source, which enables users to run etch and deposition processes simultaneously. This process enables users to achieve a high degree of process flexibility by eliminating the need for time consuming substrate transfers between the etch and deposition chambers. This asset also offers a range of substrate temperature control capabilities, enabling precise control of temperature profiles for sensitive processes. Finally, Rainbow 4400 offers advanced safety features such as automatic chamber evacuation, fire detection, and ESD protection. This model provides an industry standard for particle generation and chamber cleanliness, thanks to its advanced chamber design, powerful filtration equipment, and onboard safety interlocks. LAM RESEARCH Rainbow 4400 is an essential tool for advanced etch and deposition processes. Its sophisticated design, robust control features, and cutting-edge safety features enable Rainbow 4400 to provide high levels of throughput, repeatability and flexibility.
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