Used LAM RESEARCH Rainbow 4400B #9176765 for sale

LAM RESEARCH Rainbow 4400B
ID: 9176765
Plasma etcher.
LAM RESEARCH Rainbow 4400B is an advanced etching and ashing equipment designed to provide semiconductor manufacturers with enhanced process performance, uniformity, and flexibility. The system features a high-performance, multi-axis platform, along with a variety of configurable modules and components to ensure optimized etching and ashing solutions for physical-chemical processing, device fabrication, electro & optoelectronic, and MEMS applications. LAM RESEARCH RAINBOW 4400 B features multiple gas control options, allowing for real-time, high-precision process control. Its advanced Smart Mass Flow Controllers (MFCs) are able to regulate and monitor the pressure, flow rate and other parameters of up to eight different gases in real time and without affecting the power supply. This ensures maximum process flexibility, reproducibility, and overall high-performance results. The unit is controlled by a touch-screen human-machine interface (HMI) with advanced diagnostics and data analysis tools. It also has a wide range of customizable process recipes, allowing the etching and ashing machine to be easily adapted to a variety of semiconductor configurations. The programmable sophisticated software drivers perform calculations and corrections to ensure optimized etching results in shorter processing times and higher yields. Rainbow 4400B offers highly precise automated wafer handling and transport systems, an on-board process monitor, and advanced fault-diagnostic capabilities. Its self-calibration tool and multiple safety features ensure optimal process control, stability, and safety. The asset is capable of processing up to 100 wafers in a single run and offers an optional auto-clean feature to ensure flawless device fabrication results. RAINBOW 4400 B offers a variety of add-on components for tailoring the etching and ashing chamber to a specific application, process, or requirement. It also features a high-accuracy endpoint detection model, capable of controlling and monitoring the etching and ashing process with precise accuracy and repeatability. The advanced design and construction of the equipment offer excellent etching and ashing versatility and performance, while ensuring accurate, consistent results.
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