Used LAM RESEARCH Rainbow 4420 #293587259 for sale

LAM RESEARCH 4420 is an advanced etch/ash tool optimized for substrate processing of high aspect ratio structures. This etcher-asher is ideal for applications with multiple layer deposition requirements, such as deep trench etch and silicon on insulator (SOI). It is capable of etching and depositing up to 15 layers of temperature sensitive materials and can support etching of up to 1µm deep trenches. LAM RESEARCH 4420 features a state-of-the-art design that ensures uniformity and stability of the etch/ash process, while allowing precise customized process control. It is built with a variable pressure (VP) physical vapor deposition (PVD) chamber and a variable-capacitance plasma source (VCPS) for etching. This advanced etcher-asher provides for low ion contamination, high uniformity, and excellent selectivity. The chamber provides a temperature-stable environment, allowing for independent control of etch rate, selectivity and uniformity. The VCPS delivers high etch rate and inert etch-stop capabilities to ensure reproducible etch/ash. The 4420 is also equipped with advanced cooling technology and is backed by LAM's deuterium uniformity profile service. The 4420 offers a wide range of repeatable, high-fidelity process capability in all etching and deposition tools, including sputtering, Physical Vapor Deposition(PVD-with variable power) , Metal-Organic Chemical Vapor Deposition (MOCVD), ion-implantation, wet etch, Dry-etch, and dry-clean functions. Its intuitive controller and intuitive user interface facilitates easy customization of process parameters. LAM RESEARCH 4420 etcher-asher is also designed to accommodate borderless etching in difficult geometries, as well as multi-level etching with high uniformity and repeatability. This allows for maximum design flexibility for membrane structures, 3D geometries, integrated wires and vias, and interconnects. In addition, the built-in Focused Ion Beam (FIB) is used for fine tuning and post-etch process analysis. This etcher-asher is ideal for device modification, TFT formation and process optimization for semiconductor production. The state-of-the-art control and monitoring systems ensure reliable etch-ash operation and yield.