Used LAM RESEARCH Rainbow 4420 #293821536 for sale

LAM 4420 Automatic Plasma Asher/Etcher is a fully automated tool intended for high volume plasma based surface processing applications. This equipment combines the capability of both an asher and an etcher into one platform for convenience and cost savings. 4420 utilizes a high powered inductively coupled plasma (ICP) source to provide an extremely fast and efficient processing environment with low operating costs. LAM 4420 has a modular design which allows for easy customization for various applications. This includes a choice of either a diffusion or parallel source which ranges from 150 to 800 watts of power. The system also contains a 20-inch vacuum chamber with a horizontal and vertical variable tilt option. The chamber is equipped with an onboard o-ring seal and gas control unit to maintain a consistent vacuum and plasma process. 4420 is equipped with a processing control machine giving users the ability to control the gas flow, chamber pressure, and RF power with accuracy and precision. In addition to its efficient processing capabilities, LAM 4420 also offers a user-friendly interface designed to accommodate varying degrees of process complexity. This platform has intuitive, graphical user-interfaces that allow operators to customize the etching parameters for each process step and easily view the results. 4420 is also compatible with various compatible software packages such as SEMVision, LamView and SPX Tool are providing users access to advanced control, data collection and analysis, and process validation features. LAM 4420's parallel and diffusion sources provide a reliable, non-contact plasma source for etching and reactive ion etching (RIE) in order to independently control the properties of the surface. This feature allows users to precisely control the etching process down to a few nanometers. Additionally, 4420 features multiple gas boxes, allowing users to move to a variety of process gases and utilize up to three separate gas mixes with minimized downtime. LAM 4420 has been successfully used in many laboratory and production applications, ranging from solar cell and semiconductor device etching to lithography applications. This flexible capability allows users to achieve the optimum mix of etch rates and selectivity. Furthermore, this user-friendly platform comes with numerous safety features including an onboard interlock asset, windows-based user protection model, and safety-optimized cell designs.