Used LAM RESEARCH Rainbow 4420 #63700 for sale

LAM RESEARCH Rainbow 4420 is a high-end plasma etcher designed to provide precise and repeatable control of profile and etching rate over a wide process window. The equipment is ideal for the fabrication of high-performance microelectronic substrates such as multi-level interconnects, MEMS, and various other applications requiring high-throughput plasma etching. Rainbow 4420 utilizes a large-scale area-overlap etching chamber which is based on a closed-loop atmospheric pressure (APC), induction-driven end-point controlled RF (IDEP) plasma sources, advanced etching stations, wafer-handling, and automation solutions. It features advanced in-situ cleaning technology, as well as a dry/wet/mix etching capability. In addition to an x-y scanner-type platen, the system uses a high-speed in-situ surface monitoring unit (ISMS) that detects variations in the etching parameters, such as plasma etch rate, uniformity, and profile control. This machine also includes the latest high-rate etching technology, reducing etching time for 3D surface structuring. The robust make of the tool ensures that its performance is not affected by corrosive chemistries, and that it can operate at process temperatures up to 300 degrees Celsius (572 degrees Fahrenheit). The asset manufactures high-quality, high speed, nanometer-scale accuracy linear and circular etching, with excellent etching rate uniformity and repeatability across the etch area. The model is equipped with safety features to provide a safe working environment and comply with stringent safety regulations. LAM RESEARCH Rainbow 4420 supports various etching chemistries, including CF4, CHF3, C2F6, and SF6, as well as other photoresist and polymer-based materials. Rainbow 4420 allows the user to select from a wide range of etching options and chemistries, while providing a reliable and powerful etching process. The user also has the ability to select a wide range of processing parameters such as temperature, pressure, and flow, as well as the ability to perform maintenance operations. LAM RESEARCH Rainbow 4420 provides users with an efficient and reliable etching process to produce highly-accurate, multi-level structures with superior surface properties and excellent etch quality. With its robust design, safety features, and robust process and substrate handling capabilities, the equipment is suitable for a wide range of high-performance microelectronic applications.