Used LAM RESEARCH Rainbow 4420 #9184687 for sale

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ID: 9184687
Poly etcher, 8" Install type: Thru-the-wall (TTW) Status lamp SECS I interface Cassette interface: (2) Hine 38F indexers Electrostatic chuck (ESC) Endpoint detection: Monochromator 405nm/520nm Turbo: SEIKO SEIKI STP H200C RF Match type: LAM On-board RF Generators: No RF Generator: ENI OEM-650A RF Hours: 402056 Remote RF cart: No ATM Passivation module: No Plasma LLK (PLL): No High conductance manifold: No Gas box: Remote gas box: No Orbitally welded GB: Yes Backside cooling MFC: Unit 1250A Gases: #1: N2, 200 sccm, unit 1200A #2: CHF3, 50 sccm, unit 1200A #3: N2, 300 sccm, aera #4: N2, 500 sccm, unit UFC 1660 #5: CF4,150 sccm, unit 1200A #6: SF6,150 sccm, unit 1200A #7: He, 1 slm, Unit UFC 1660 #8: O2, 200 sccm, unit UFC 1660 Pumps: Heated pumping manifolds: No Pump controller: iQ Series Entrance / Exit: EDWARDS iQDP-40 Main: EDWARDS iQDP-80 Chillers: (2) SMC HRS018-WN-20-M On-board AC distribution type: Fused Power requirements: 208VAC, 3-Phase, 5-Wire 1993 vintage.
LAM RESEARCH Rainbow 4420 is an etcher/asher designed for reliable, cost-effective and high-yield photolithography processes in a variety of corrosive applications. This high-performance equipment offers an optimal mix of high resolution, large area processing and minimal contamination. Rainbow 4420 features a 30 cm x 45 cm (12" x 18") processing area for optimal area coverage. It is constructed out of highly corrosion-resistant stainless steel and can efficiently accommodate up to 6 process baths, allowing for a wide range of applications. The system is capable of processing the widest range of materials available and even includes an integrated susceptor lift unit that can accommodate up to 2.5 cm (1") of susceptor movement. Additionally, the uniquely designed waste recovery systems ensure that any etch residue is safely kept away from the processing area to reduce environmental impact. In terms of operation, LAM RESEARCH Rainbow 4420 is specifically designed to operate in low temperature vacuum or low pressure environments which ensures efficient, safe and reliable operation. The unique susceptor lifts and bellows-sealed window ports provide the necessary pressure control required for substrate loading and unloading. In addition, the built-in particle-free purging systems and easy switch technology work together to control the ultra-high purity gas streams used in the etching process. Moreover, Rainbow 4420 features an interactive user interface designed for easy control and monitoring. The machine also utilizes embedded intelligent diagnostics for continuous process optimization. All in all, LAM RESEARCH Rainbow 4420 etcher/asher is a reliable and cost-effective solution for high precision and high yield photolithography process. It provides a unique combination of advanced etching technology and efficient waste recovery systems that reduce environmental impact.
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