Used LAM RESEARCH Rainbow 4420 #9226295 for sale

ID: 9226295
Wafer Size: 5"
Vintage: 1990
Etcher, 5" Wafer type: Major flat Clamp Temperature control unit: CS15W Chiller Hardware: Cassette indexer: Hine indexer 38A Process kits Baratron: MILLIPORE 0-10 Torr RF Rack: ENI OEM-650A XL RF Matcher Helium cool system EDP (8) MFC Gases: HE / 500 SCCM / FC-770AC CL2 / 200 SCCM / FC-780C HBR / 200 SCCM / FC-780C CF4 / 200 SCCM / FC-770AC SF6 / 200 SCCM / FC-770AC CHF3 / 50 SCCM / FC-770AC O2 / 10 SCCM / FC-770AC O2 / 200 SCCM / FC-770AC Vacuum system: Loadlock: EDWARDS QDP80 P/C: EDWARDS QDP80 / QMB250 Signal tower AC Power rack 1990 vintage.
LAM RESEARCH Rainbow 4420 is a high performance etcher and asher designed for etching and ashing operations of a broad range of materials. It features an efficient vacuum chamber, high throughput, and advanced process monitoring and control capabilities. Rainbow 4420 is an easy-to-use equipment, boasting a smaller footprint, robust construction, and a user-friendly interface. Its vacuum mechanism reaches the industry standard of 1 Torr. Its evaporation sources are designed to reach an elevated temperature and deliver high throughputs with low resistivity of the substrate. The chamber is kept at a constant temperature from the bottom to the top by a temperature controller located at the top of the equipment. In addition to its efficiency and functionality, LAM RESEARCH Rainbow 4420 features a high-performance process monitoring and control system. This unit is capable of providing real-time information during processing, ensuring high quality results and reproducible processes. Rainbow 4420 is equipped with advanced safety mechanisms to protect the machine and users, and includes tools to prevent electrostatic discharges. This tool is also resistant to extreme temperatures and corrosive gases, offering reliability and longevity. LAM RESEARCH Rainbow 4420 can be used for dry etching and deposition, atomic layer deposition (ALD) and chemical vapor deposition (CVD). It offers precise control of layer thickness and other parameters throughout the etching process. The chambers are also capable of handling substrates up to 8" and higher. Ultimately, Rainbow 4420 is a versatile and reliable machine for accurate and reproducible etching and ashing processes. Its advanced features, precise control, and safety benefits make the machine an ideal choice for the industrial and scientific communities.
There are no reviews yet