Used LAM RESEARCH Rainbow 4420 #9226295 for sale
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ID: 9226295
Wafer Size: 5"
Vintage: 1990
Etcher, 5"
Wafer type: Major flat
Clamp
Temperature control unit: CS15W Chiller
Hardware:
Cassette indexer: Hine indexer 38A
Process kits
Baratron: MILLIPORE 0-10 Torr
RF Rack: ENI OEM-650A XL
RF Matcher
Helium cool system
EDP
(8) MFC Gases:
HE / 500 SCCM / FC-770AC
CL2 / 200 SCCM / FC-780C
HBR / 200 SCCM / FC-780C
CF4 / 200 SCCM / FC-770AC
SF6 / 200 SCCM / FC-770AC
CHF3 / 50 SCCM / FC-770AC
O2 / 10 SCCM / FC-770AC
O2 / 200 SCCM / FC-770AC
Vacuum system:
Loadlock: EDWARDS QDP80
P/C: EDWARDS QDP80 / QMB250
Signal tower
AC Power rack
1990 vintage.
LAM RESEARCH Rainbow 4420 is a high performance etcher and asher designed for etching and ashing operations of a broad range of materials. It features an efficient vacuum chamber, high throughput, and advanced process monitoring and control capabilities. Rainbow 4420 is an easy-to-use equipment, boasting a smaller footprint, robust construction, and a user-friendly interface. Its vacuum mechanism reaches the industry standard of 1 Torr. Its evaporation sources are designed to reach an elevated temperature and deliver high throughputs with low resistivity of the substrate. The chamber is kept at a constant temperature from the bottom to the top by a temperature controller located at the top of the equipment. In addition to its efficiency and functionality, LAM RESEARCH Rainbow 4420 features a high-performance process monitoring and control system. This unit is capable of providing real-time information during processing, ensuring high quality results and reproducible processes. Rainbow 4420 is equipped with advanced safety mechanisms to protect the machine and users, and includes tools to prevent electrostatic discharges. This tool is also resistant to extreme temperatures and corrosive gases, offering reliability and longevity. LAM RESEARCH Rainbow 4420 can be used for dry etching and deposition, atomic layer deposition (ALD) and chemical vapor deposition (CVD). It offers precise control of layer thickness and other parameters throughout the etching process. The chambers are also capable of handling substrates up to 8" and higher. Ultimately, Rainbow 4420 is a versatile and reliable machine for accurate and reproducible etching and ashing processes. Its advanced features, precise control, and safety benefits make the machine an ideal choice for the industrial and scientific communities.
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