Used LAM RESEARCH Rainbow 4420 #9262992 for sale
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ID: 9262992
Wafer Size: 8"
Plasma etcher, 8"
Thru-the-wall (TTW)
Status lamp
SECS I Interface
Cassette interface: (2) HINE 38F indexers Electrostatic Chuck (ESC)
Endpoint detection: Monochromator 405nm / 520nm
Turbo: SEIKO SEIKI STP H200C
RF Match type: LAM
RF Generator: ENI OEM-650A
RF Hours: 402056
Gas Box:
Orbitally welded GB
Backside cooling MFC: 1250A
No remote gas box
Gases:
N2, 200 sccm, unit 1200A
CHF3, 50 sccm, unit 1200A
N2, 300 sccm, area
N2, 500 sccm, unit UFC 1660
CF4, 150 sccm, unit 1200A
SF6, 150 sccm, unit 1200A
He, 1 slm, unit UFC 1660
O2, 200 sccm, unit UFC 1660
Pump:
Pump controller: iQ Series entrance
Exit: EDWARDS iQDP-40
Main: EDWARDS iQDP-80
(2) SMC HRS018-WN-20-M Chillers
On-board AC Distribution type: Fused
No heated pumping manifolds
No high conductance Manifold
No ATM passivation module
No remote RF cart
No on-board RF generator
Chiller and RF included
Does not include vacuum pump
Power supply: 208 VAC, 3 Phase, 5-Wire.
LAM RESEARCH Rainbow 4420 etcher/asher is a high-performance, precision instrument designed to reduce erosion, modify, and create intricate patterns on a wide variety of substrates. Rainbow 4420 is a highly versatile etcher/asher, capable of processing a variety of materials including quartz, silicon, gallium arsenide and other semiconductor materials. LAM RESEARCH Rainbow 4420 utilizes advanced techniques and technologies, such as laser ablation, ion beam assisted etching, reactive ion etching and chemical vapor deposition, to produce exacting results. Featuring a wide range of application-specific processing capabilities and functions, Rainbow 4420 is designed to meet the specific process requirements of a variety of electronic and semiconductor applications, including the forming of ultra-thin layers of electrically conducting material. With these advanced capabilities and a reputation for reliability and efficiency, LAM RESEARCH Rainbow 4420 is a premier solution for etching and ashing requests requiring ultra-fine feature accuracy and repeatability. Rainbow 4420 offers an impressive combination of performance and flexibility. Its modular design ensures that configurability can be optimally tailored for each application and the equipment's open platform architecture facilitates rapid interchange and optimization of local parameters. Equipped with a powerful configurable wafer analysis system, LAM RESEARCH Rainbow 4420 allows for precise measurements and analysis of the quality of the etching and ashing results in real time. Rainbow 4420 features a highly reliable mechanical unit and a versatile array of vacuum chamber options to suit different processes, including batch, singlewafer and inline processing. To ensure process stability and reduce sources of machine-induced nonuniformity, LAM RESEARCH Rainbow 4420 utilizes advanced control and temperature management systems. The tool can also be supplied with an automatic calibration program to ensure optimal asset tuning and performance. Ideal for high-end etching and ashing needs, Rainbow 4420 can be loaded with up to 12 process recipes, enabling the creation of complex process sequences with ease. For maximum operational accuracy and repeatability, LAM RESEARCH Rainbow 4420 is equipped with two independent plasma sources which can be used for etching and ashing. The high-precision end-of-process monitoring feature helps prevent excessive etching and ashing, and its high-precision shutter facilitates reproducibility to +/- 0.2 microns. With its advanced technical specifications, Rainbow 4420 provides the industry with a powerful, accurate solution for etching and ashing applications in a wide range of industries.
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