Used LAM RESEARCH Rainbow 4420 #9300199 for sale

LAM RESEARCH Rainbow 4420
ID: 9300199
Wafer Size: 6"
Etchers, 6".
LAM RESEARCH Rainbow 4420 is an etcher / asher, also known as a plasma etcher, designed to deposit thin films, etch feature patterns and create plasma coatings that support device processing. It can deposit thin films of dielectric and polysilicon in a variety of heights, widths and depths. Rainbow 4420 etcher provides the ability to etch or asher a wide range of materials, including polysilicon, silicon oxide and silicon nitride. The etcher also provides outstanding repeatability and uniformity in the material etch or asher process. LAM RESEARCH Rainbow 4420 etcher utilizes a simultaneous S/D Process to uniformly deposit and clean the substrate material. This process utilizes a combined RF bias, substrate bias and gas injection to etch a more uniform etch structure and clean the substrate in a very repeatable and uniform manner. The combined process also supports high quality etch to lowest possible cost. Rainbow 4420 etcher has a modular, flexible architecture which provides high uptime and consistency across materials, substrates and etch profiles. The etcher features a linear-motor-driven, rotary table which allows for rapid substrate switching and offers flexibility for varying limits and/or conditions. LAM RESEARCH Rainbow 4420 etcher also features a vision-based alignment system to reduce the manual alignment, which in turn reduces the risk of human error. Rainbow 4420 etcher has multiple gas channels and direct gas injection to provide an optimal gas flow, thus improving selectivity and creating an optimized etch profile. It also utilizes a turbo pumped, computer-controlled vacuum system with load lock technology to ensure clean and consistent plasma processing with minimal pump-down time. LAM RESEARCH Rainbow 4420 etcher also comes with a user-friendly control system that can access recipes and provide detailed process information on its graphical user interface. The software comes with powerful batch processing capability and can be used to load, unload and monitor multiple recipes. The software also supports traceability of process data and archived recipes for future use. Overall, Rainbow 4420 etcher provides the industry with a cost-effective etching and plasma processing tool that has been designed for repeatability and uniformity in various etch profiles. The etcher's unique design provides repeatable and uniform process results, enabling semiconductor manufacturers to obtain more reliable and consistently reproducible results.
There are no reviews yet