Used LAM RESEARCH Rainbow 4420 #9364647 for sale

LAM RESEARCH Rainbow 4420 is an etcher or asher equipment designed to provide efficient wafer etching. This system features a rectangular shaped process chamber that is 2.5 feet (761 mm) long and 4.2 feet (1290 mm) wide. The process chamber is outfitted with a convection bottomed cleaning stage, a gas manifold to deliver and introduce different gases into the process, and a downstream plasma etch source. Rainbow 4420 is powered by a 400 MHz RF generator, which is compatible with both capacitively coupled and inductively coupled process modes. This makes the unit versatile enough to handle a wide range of process requirements. This machine operates with both pressurized and vacuum environments, allowing for a choice of etch chemistries and techniques. LAM RESEARCH Rainbow 4420 is suitable for doing a variety of etching techniques, such as anisotropic, isotropic, and deep reactive-ion etching (DRIE). It also offers semi-automated wafer load-up and post-etching substrate removal, allowing for a greater degree of process control. Rainbow 4420 is configured for loading up to 200 8-inch (200 mm) wafers at a time, though this number will depend on the chosen etch chemistry. The tool offers etch rates ranging from 1-400 angstroms per minute. It also allows for up to 6 sequential etching steps, which can be stored in user-defined recipe libraries. LAM RESEARCH Rainbow 4420 is a versatile etcher or asher asset, providing a host of etching abilities and process control options. Its 400 MHz RF generator allows for a wide range of choosing etch chemistries and techniques, as well as etch rates up to 400 angstroms per minute. It has a large process chamber, which can hold up to 200 8-inch (200 mm) wafers at once, and offers up to 6 sequential etching steps. With user-defined recipe libraries to store etch processes, Rainbow 4420 can provide reliable and repeatable results for all etching applications.