Used LAM RESEARCH Rainbow 4420 #9406916 for sale

LAM RESEARCH Rainbow 4420 is a batch plasma asher/etcher designed for high throughput processing in a variety of R&D and production environments. This asher features excellent process control, advanced high-density plasma technology, and comprehensive environmental protection. Rainbow 4420 offers superior doping profiles, step coverage, and wafer uniformity. The equipment is also specifically designed for maskless and single-counter processing. LAM RESEARCH Rainbow 4420 provides optimal etching performance in polysilicon, poly-SiGe, SiO2, low-k films, and many other materials. The system has excellent control of the reactive ion etch (RIE) process and provides superior uniformity across a wide wafer size range. Rainbow 4420 also offers excellent uniformity and step coverage with high etch rate and selectivity. The unit has a configurable gas delivery machine that supports multiple etching techniques and processes. LAM RESEARCH Rainbow 4420 also comes with a number of safety and environmental features such as advanced UPAV, WSUV and ATXV units. The UPAV (User Protection & Analysis Visibility) unit monitors processing parameters and ensures optimal environmental conditions in the tool. The WSUV (Wafer Sensitivity unit) measures wafer uniformity and ensures that process results are consistent and repeatable. The ATXV unit controls volatile organics and purifies exhaust gas to ensure a safe work environment. Rainbow 4420 also features a state-of-the-art user interface, which makes controlling the etching process easier and more user-friendly. The user interface allows users to monitor key process parameters in real time and adjust settings as required. The interface also features alarm and warning features that alert users of problems or anomalies during the process. LAM RESEARCH Rainbow 4420 is an ideal etcher/asher for R&D and production applications where etching process control and precision are key. It offers superior throughput, process control and performance, and excellent safety and environmental protection. The robust user interface and advanced monitoring systems make this asset a great addition to any etching facility.