Used LAM RESEARCH Rainbow 4420 #9411613 for sale
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ID: 9411613
Wafer Size: 6"
Plasma etcher, 6"-8"
EDWARDS iQDP80 / QMB500 Pump chamber
Indexer type: Hine 38A, 6"-8"
Robot type: Harmonic drive
Robot blade: AL, 6"-8"
EMO Button guard ring
FST Chiller
CRT Monitor
Chamber type: Standard
Process: Plasma cleaner
Controller: 32-Bit Microprocessor with CRT
AL Anodize
Source type: Plasma system
RF Power: OEM-12A
Photodiode optical Endpoint
AC2 Pressure control
Temp control: Chiller
Chuck Type: Mechanical clamp, 6"
Match: Manual
Gases:
Model / SSCM / Gas
UFC-1200 / 100 SCCM / O2
UFC-1200 / 300 SCCM / O2.
LAM RESEARCH Rainbow 4420 is an etcher/asher that offers unmatched precision and productivity in semiconductor applications. Rainbow 4420 has a wide range of advanced features designed to maximize throughput, including a powerful control equipment, a variety of etch recipes, and precise temperature and pressure control. The system's robust design allows for greater precision and consistency of etching and ashing results. LAM RESEARCH Rainbow 4420 provides users the flexibility to choose between single etch or concurrent etch/ash cycles, depending on the desired process. Multiple runs can also be combined into a single operation. The unit's control machine features an intuitive user interface, allowing for rapid recipe setup, parameter adjustments, and data logging for maximum process optimization and traceability. The tool's dual process chambers allow for multiple etch processes to be run simultaneously, with a separate gas delivery asset for each chamber. Rainbow 4420 also features a unique atmosphere control model, which uses an advanced RF-controlled gas flow equipment to provide precise gas flow control and uniform chamber cooling. The system also features an advanced cooling unit to maintain consistent temperatures in the chamber, allowing for repeatable and accurate wafer results. LAM RESEARCH Rainbow 4420 etcher/asher has a vacuum capacity of 1 Torr and a tight process temperature range of -15° to +30° Celsius. Multiple etch/ash recipes can be created and stored, with each recipe having adjustable parameters such as etch accuracy, rate, temperature, and timing. The machine also offers a range of different etch gases, allowing for etching of more than 20 different materials including polysilicon, nickel, and aluminum. The tool also features advanced safety features to protect personnel and equipment, such as an RF-based interlock asset to prevent accidental radio frequency interference. Rainbow 4420 is designed to be extremely energy-efficient, with a total estimated energy use of 14 kWh per hour of etching. The unit also features a built-in fan and alarm model which alert personnel if the equipment is approaching its maximum capacity. LAM RESEARCH Rainbow 4420 etcher/asher is a state-of-the-art system ideal for laboratories, companies, and universities looking to maximize productivity and precision in their etching and ashing operations. This large capacity tool delivers accurate and repeatable results, enabling facilities to quickly and reliably produce wafers and/or components. With its ease of use, robust design, and precision control, Rainbow 4420 is an excellent choice for those looking to maximize productivity in their etching and ashing operations.
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