Used LAM RESEARCH Rainbow 4420B #293828102 for sale

LAM RESEARCH Rainbow 4420B is an etcher/asher designed to produce high-quality, uniform etches over broad material and feature size ranges. This highly automated equipment is equipped with an ion source and a controller that is designed to align accurately, allowing for rapid and accurate placement of ions for optimal etch speed and uniformity. The controller is capable of controlling source frequency and power, enabling multiple plasma frequencies and power levels to be set for applications such as high-aspect-ratio etching, as well as plasma cleaning. Its ability to maintain a uniform distribution of ions within the reactor chamber further ensures uniform etch profile. Rainbow 4420B is equipped with two separate reaction chambers, both of which are made of stainless steel for improved corrosion resistance. The chambers are USB-controlled, allowing for easy setup and operation. Both chambers are equipped with RF power supplies, which are capable of controlling power levels. The single gas input system allows for the introduction of Ar, N2, O2, and other process gases into the etcher/asher. In addition, the unit is also equipped with features such as an advanced temperature controller, vacuum control machine, and a sophisticated diagnostic tool, which are all designed to optimize asset performance. The temperature controller allows for precise temperature control over the two reaction chambers and the vacuum control model provides for rapid ramping of process pressures. LAM RESEARCH Rainbow 4420B is also equipped with advanced measurement capabilities such as thin-film reflectance measurements, quartz crystal monitors, and optical interferometers. These features are designed to facilitate process control, as well as allow for real-time monitoring of the etching process. Rainbow 4420B provides an excellent solution for etching and ashing applications, with its combination of accuracy, flexibility, and uniformity. Its advanced features and automated operations enable improved process repeatability and high throughput, while its sophisticated diagnostics features enable fast fault detection. The equipment is an excellent choice for applications that require fast, high-density etching and uniform feature sizes.