Used LAM RESEARCH Rainbow 4500 #293757796 for sale

LAM RESEARCH 4500 is a reactive ion etcher (RIE) equipment used for dry etching processes. It is equipped with a 26 cm LAM RESEARCH parallel plate large area plasma source for CO2/SF6 which provides high etch rates and uniformity. The system accommodates 200 mm wafers, and can evenly etch surfaces with a range of doping levels. It is capable of etching challenging materials such as Al2O3, SiO2, and organic materials. The unit has 13 process chambers that allow for more sophisticated and precise processes for etching wafers. The precision of the etching process is improved with a control wafer feeder, which can accommodate a consistent thickness across different wafers. The machine also has a precision velocity floating zone process, allowing the etching process to be accurately tuned to the materials being etched. Other features of the tool include a temperature and pressure control to help create repeatable and consistent etching processes. 4500 can be used to etch a variety of materials, such as metal oxides, compounds, nitrides, olefins and others. With its precision etching process and the long-term reliability, it is ideal for a variety of applications, including MEMS devices, nanotechnology, and micro-fabricated circuits.