Used LAM RESEARCH Rainbow 4500 #9276087 for sale

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ID: 9276087
Oxide etcher, 6" ESC Turbo pump Does not include chiller and dry pumps.
LAM RESEARCH 4500 is an industry-standard etching and ashing system that provides excellent etch and ashing performance and accuracy for a wide range of semiconductor and MEMS applications. It is an ideal tool for precision etching and ashing of various materials such as silicon, aluminum, copper, nickel, gold, and other metals. 4500 is an inductively coupled plasma (ICP) etcher/asher equipped with a full range of features that makes it a powerful and reliable tool for etching and ashing. LAM RESEARCH 4500 offers high-precision capabilities, repeatable performance, and low cost of ownership. It is capable of etching and ashing at high throughputs and tight tolerances with selective area etching and an optional ion beam. It features a high degree of user customization, allowing users to tailor their process settings to meet application requirements. 4500 is equipped with advanced process monitoring and control systems that allow users to adjust process parameters as needed. The etcher/asher is also outfitted with a PID control system and a digital controller, which ensure optimum performance. The digital controller also allows users to perform custom etch and ashing recipes for greater process control. LAM RESEARCH 4500 is equipped with a wide range of software and hardware features that make it suitable for a variety of materials etching and ashing applications. It offers flexible chamber configurations, advanced gas delivery systems, and a wide range of pressure settings for achieving the desired process results. Additionally, it includes advanced substrate handling and loadport automation systems, as well as post-processing diagnostics. In conclusion, 4500 is an excellent etcher/asher that provides users with the highest accuracy available in the industry. It is highly customizable and offers a wide array of features and software controls. Its high throughput, precision, and advanced process control and monitoring system make it suitable for a variety of etching and ashing applications.
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