Used LAM RESEARCH Rainbow 4501 #9196384 for sale

LAM RESEARCH Rainbow 4501 Asher / Etcher is a highly productive, advanced, high throughput plasma etch and chemical gas processing equipment. This platform offers an innovative high quarter-cavity design, allowing for both etched and ashed substrates to undergo processing simultaneously, thus resulting in significant improvements in throughput and yield. The system offers excellent control precision, with a precision of +/- 5nm and a sub-micron self-aligning wafer chuck that can handle wafers up to 300 mm in diameter. This unit is equipped with a large, intuitive, graphical user interface, and features a highly automated, repeatable process that enables repeatable uniformity and easy operation. Rainbow 4501 has a highly efficient negative ion cyclotron resonance (NICR) source that simultaneously delivers ions, radicals and other species with great process flexibility and high selectivity, enabling the machine to meet the requirements of various applications. For external low temperature applications, the tool can be configured with a robot to process up to three process chambers simultaneously. The asset offers extended process flexibility with access to a broad range of process chemistries, including etching, ashing, grooving, and nanobumping. It offers high productivity with rates up to 500 wafers per hour and is capable of processing multiple samples with different processes in a single process run. It also features effective choice and maintenance of multiple gas and ash chemistry. This model comes with built-in computer hardware and software for easy programming of recipes and equipment management. LAM RESEARCH Rainbow 4501 is capable of delivering superior profile control with low angle and high aspect ratio etching. It features superior uniformity with uniformity levels of 2 sigma +/3 sigma +/4 sigma and a temperature control range of 68°C to 550°C. It also offers broad temperature and pressure control range, allowing for processes with temperatures up to 600°C and pressures up to 500 Torr. In addition, the system offers excellent particle control and lifetime management with advanced filtration systems providing the necessary cleanroom environment and superior process control. This overall results in a robust unit designed to provide the best possible angle and aspect ratio control and precise temperature and pressure control.