Used LAM RESEARCH Rainbow 4520 XL #293640389 for sale
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ID: 293640389
Wafer Size: 6"
Etcher, 6"
ESC
RF Generator and match: 2 MHz / 27 MHz
OSAKA HGP TS443 Pump
End point detector: Monochromator
Orbital gas box
Load lock system.
LAM RESEARCH Rainbow 4520 XL is an etcher/asher equipment that utilizes advanced technology to etch and ash on a variety of substrates, including wafers and metals. LAM RESEARCH RAINBOW 4520XL provides an advanced system for etching high-aspect ratio trenches, as well as ultra-deep recess etching and high-speed, high-resolution etching of difficult substrates. Rainbow 4520 XL offers industry-leading performance in its ability to etch both shallow and deep trenches with consistent uniformity and fine line sizes. The unit features a high-pressure turbojet gas delivery machine that is integrated with a high-precision plasma source, maximizing productivity and providing for reliable process results. The gas delivery options on the 4520 XL also allow for a wide variety of etch chemistries for different process applications. The tool features a closed-loop, automatic slit-scanning asset that uses an innovative dual-gas injector design that allows for consistent gas flow control for precise etching and ash processes. This model utilizes advanced process control algorithms to ensure the optimal gas flow, gas pressure, and etch/ash parameters are consistently met. The gas injector equipment is also designed to provide for an optimized process flow when etching with thinner layers. RAINBOW 4520XL offers industry-leading performance for etching different substrates, including stainless steel, aluminum, titanium, and other metals. The high-speed, high-resolution etching of these substrates ensure that even the most difficult geometries can be achieved. The system also offers a variety of advanced features, including integrated process monitoring, fault detection and diagnosis, and process performance optimization. The integrated process monitoring unit features a variety of alarms that can be easily configured to alert operators of any errors or process issues that need to be addressed, and the fault-detection and diagnosis machine can provide valuable feedback and process data for identifying any process issues that may need to be addressed in order to achieve optimal results. Finally, the advanced process optimization feature allows for the etch rate, wafer position, and etch/ash parameters to be dynamically adjusted, ensuring the highest levels of productivity and process quality are achieved. In summary, LAM RESEARCH Rainbow 4520 XL is an etcher/asher tool that provides leading-edge performance and process flexibility for etching wafers and metals with high-aspect ratio trenches, ultra-deep recess etching, and high speed, high-resolution etching. The asset is designed to provide the highest levels of process quality, productivity, and process repeatability, while also providing operators with advanced process monitoring, fault detection and diagnosis, and process optimization features to ensure optimal results.
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