Used LAM RESEARCH Rainbow 4520 XL #293819123 for sale

LAM RESEARCH / ONTRAK Rainbow 4520 XL is an etcher/asher used in semiconductor fabrication processes. It is a high-precision, cost-effective tool that can be used to etch and deposit materials with great accuracy and repeatability. ONTRAK Rainbow 4520 XL offers advanced process control and vast improvements over traditional etching methods. LAM RESEARCH Rainbow 4520 XL is a computer-controlled, three-axis etcher with a substrate size of up to 300 x 400 mm (12" x 16"). It features a high-precision, high-speed, digital control (HPDC) equipment, which allows for accurate, repeatable etching and deposition processes. The system is capable of extremely accurate etching with micrometer levels of control and minimal residuals. The HPDC is coupled with a Windows-based graphical user interface (GUI) so users can set parameters, modify recipes and monitor etching operations in real time. Rainbow 4520 XL is ideal for high-precision etching and deposition of materials such as silicon, glass and metal. The unit features a wide range of etching and ashing gases including SF6/Cl2, N2/CH2/H2, O2/N2 and O2/H2/Cl2. The unit also incorporates a robust plasma source with adjustable power levels and harmonics, resultanting improved process control. LAM RESEARCH / ONTRAK Rainbow 4520 XL is designed with safety and efficiency in mind. To ensure worker safety, the machine features an automated exhaust tool and interlocks to prevent unauthorized operation. The asset is also designed to minimize maintenance, with no moving parts, no water cooling and no hazardous chemicals. In addition, the model includes self-diagnostics and maintenance functions as well as predictive maintenance algorithms for maximum uptime and cost savings. Overall, ONTRAK Rainbow 4520 XL is an excellent choice for high-precision etching and deposition operations. It offers tremendous speed, accuracy, process control, and safety. This cost-efficient equipment can be used for a variety of materials, ensuring high-quality etching and deposition processes for semiconductor devices.