Used LAM RESEARCH Rainbow 4520 #9280619 for sale
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ID: 9280619
Wafer Size: 6"
Oxide etcher, 6"
Gases:
Gas 1 / AR
Gas 2 / CF4 / SF6
Gas 3 / CHF3
Gas 4 / HE
Gas 5 / O2
UPC HE
Standard gas box
Calibration
Gas weldment polish
Bottom gas panel exhaust
Wafer transfer:
Open cassette exit, 6"
Entrance load lock wafer holder
Hinge 38A receiver / Sender indexer
Belt driven load station
Standard load station shuttle spatula
AC power:
Fuses for AC/DC power box
AC Input power supply: 208 V, 3 Q, 5 W, 30 A
RF Power supply: 2.2 kW, 400 kHz
Chamber configuration:
Envision system with CRT
Bulkhead system mount
Chamber with variable gap electrode
Automatic match system
Electrode temperature unit interface
Endpoint detector: Monochromatic
ESC Chuck and module
Viton O-ring all change
Standard clean gas box
Pressure control system:
APC Controller
Throttle valve
Isolation valve open / Close type
Upper and lower electrode temperature control:
Chiller type: 2080 TCU
Dual system
Vacuum system
Main chamber: EDWARDS QDP80+QMB250
Pump / IH600
Load lock chamber: EDWARDS QDP80
Dimension and facility
Physical dimensions
Power requirements
Exhaust requirements
Cooling water
Nitrogen
Compressed air: CDA / N2.
LAM RESEARCH Rainbow 4520 is an advanced etcher/asher suitable for semiconductor device manufacturing. It is capable of delivering superior performance, quality and productivity. With an optimized chamber design that enables rapid throughput, Rainbow 4520 is a reliable and productive etching equipment. LAM RESEARCH Rainbow 4520 is capable of delivering excellent process results with minimal particle contamination. It features a high-efficiency turbo-pump, along with powerful chemical and etching procedures to achieve high throughput with excellent quality results. Additionally, the etcher has a quick-load wafer loading and unloading system to further optimize the production process. Rainbow 4520 also features an innovative 0-1-1 ultra-high pressure (UHP) gas unit which enables the production of sophisticated patterned devices with low stress profiles. The machine has state-of-the-art deposition walls, advanced gas panel and process chamber, and a temperature controller to minimize particle and defect contamination. Asher technology enables excellent layer uniformity, fast cycle times and high productivity. LAM RESEARCH Rainbow 4520 offers best-in-class asher performance, for maximized device yield and excellent profile uniformity with higher amounts of material processing. The tool is configured with a robust process control suitable for quality checks and process tuning. Rainbow 4520 also supports advanced bellows and baffle components, allowing for more efficient HF-based etching at ultra-low pressures. Additionally, the asset can be configured with unique sensor diagnostics that enable rapid process feedback, online maintenance, and continual improvement of etching performance and yield. Finally, LAM RESEARCH Rainbow 4520 is a cost-effective precision etching model which offers superior productivity, quality and throughput in a cost-effective package. With an integrated controller and wide range of options, Rainbow 4520 is an ideal solution for a wide range of applications in the semiconductor device manufacturing industry.
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