Used LAM RESEARCH Rainbow 4700 #9364649 for sale

LAM RESEARCH Rainbow 4700
ID: 9364649
Wafer Size: 2"-6"
Plasma etcher, 2"-6".
LAM RESEARCH Rainbow 4700 is an advanced Plasma Enhanced Chemical Vapor Deposition (PECVD) etcher/asher equipment designed to meet the challenges of etched-layer deposition and anisotropic etching on various substrates. With its combination of ultrahigh performance and low operating costs, Rainbow 4700 is the perfect system for high-precision applications in semiconductor and microelectronic industries. LAM RESEARCH Rainbow 4700 allows precise, selective, and non-uniform etching of thin layers and high aspect ratio structures on various substrates including silicon, III-V compounds, and III-N compounds like carbon and diamond. By using the advanced PECVD technology, Rainbow 4700 is capable of controlling the etch rate and directionality, enabling precise feature patterning. Additionally, with its high aspect ratio and conformality, LAM RESEARCH Rainbow 4700 is also suitable for the deposition of ultra thin film coatings. Rainbow 4700 allows for the deposition of thin films with excellent conformality and uniformity. Additionally, the unit provides low parasitic capacitance so it can be used for high performance interconnects. The machine is also able to quickly and precisely pattern contact openings. LAM RESEARCH Rainbow 4700 also features advanced thermal management capabilities. This allows for even heating of the substrates for greater process uniformity and reproducibility. Furthermore, Rainbow 4700's closed-loop method of temperature control provides very tight temperature control, which prevents unwanted damage to the substrate. Overall, LAM RESEARCH Rainbow 4700 is an advanced etcher/asher tool that is capable of delivering high etch rates and conformality with low operating costs. With its advanced temperature control features, Rainbow 4700 is ideal for high precision coating and patterning applications. Its state-of-the-art PECVD technology makes it the perfect asset for precise, selective, and non-uniform etching on various substrates.
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