Used LAM RESEARCH Rainbow 4720 #293642252 for sale

LAM RESEARCH Rainbow 4720 is an etcher/asher that offers fast, repeatable, and cost-effective processing of substrates from thinner films to Nanometer-scale devices. Rainbow 4720 provides precision sensitive etching and ashing of materials such as dielectric films, oxides, metals, and tungsten. The advanced semiconductor process module, LAM RESEARCH Rainbow 4720, offers up to sixteen process chambers, fully automated, enabling independent control and simultaneous operation of each stage. This modular system expands the processing range, giving users the flexibility to adjust temperatures, gases, and cycle parameters to meet specific needs. Rainbow 4720 offers up to four standard wells and optional up to sixteen shallow process wells allowing up to sixteen wafer carriers to be processed independently, offer greater throughput and utilization. The system also supports manual as well as extremely clean semiconductor, nano-tech, and optoelectronic applications as a result of its advanced cleaning techniques, pull and scrubbing options. Additionally, the chamber of LAM RESEARCH Rainbow 4720 is capable of operating up to 266°C and provides a variety of gas and reactant control options to meet the user's requirements. This etcher/asher has the ability to manage multiple photoresist and etch recipes with a wide range of aqueous, organic, and high density plasmas, as well as highly reactive chemistries for ultra-clean semiconductor devices and nano-scale thin films. Rainbow 4720 also features an advanced chamber design featuring fully independent, heated chamber construction and a choice of one to eight exhaust stacks for increased etch and ashing uniformity. In addition to this, LAM RESEARCH Rainbow 4720 is engineered with a closed loop, fully exhaustable design and automatic control systems permitting minimal maintenance, high repeatability and long term reliability. To summarize, Rainbow 4720 is a powerful and versatile etching and ashing tool ideal for low volume, semiconductor, nano-tech and optoelectronic applications. It offers precision and repeatable processing of substrates from thinner films to Nanometer-scale devices in an efficient, clean and cost effective way.