Used LAM RESEARCH TCP 9400 #293608569 for sale

LAM RESEARCH TCP 9400 is an etcher / asher that uses a reactant gas to etch or asher features on a surface. This etching / ashing process is conducted in a thermal chemical vapor deposition chamber. TCP 9400 is a reliable and robust etcher that helps to create high-quality features with very short cycle times. LAM RESEARCH TCP 9400 is designed to provide a combination of high throughput, process uniformity and precision. TCP 9400 has a unique chamber design that enables highly uniform process conditions throughout the entire work area. The reactor can also handle a wide variety of process gases including chlorine, boron trifluoride, and nitrogen trifluoride. LAM RESEARCH TCP 9400 is equipped with a gas flow controller that enables precise control of the process gas flow rates. In addition, the internal pressure of the chamber can be adjusted to optimize the etching / ashing rate. TCP 9400 is an easy-to-use, cost-effective equipment that provides superior etching / ashing accuracy and repeatability. It also features an extended working distance that is suitable for various types of workpieces. The system has integrated vacuum certification, meaning a single etch can be used for both pre-etching and post-etching. Additionally, it has a water-cooled plasma source for superior temperature control and process stability. This enables increased precision, speed, and accuracy for more complex structures. LAM RESEARCH TCP 9400 is equipped with a powerful surface analysis tool that can provide real-time feedback on etching performance. The tool uses Optical Emission Spectroscopy (OES) to measure the etch depth and profile of materials. It also offers monitoring access to process parameters such as temperature, pressure, and flow rate. TCP 9400 is also equipped with an integrated data acquisition unit that allows for recording and archiving of process data. In conclusion, LAM RESEARCH TCP 9400 is an efficient and reliable etcher / asher with a unique chamber design and integrated process analysis tool. It provides excellent etching and ashing performance with faster cycle times and superior accuracy. Its excellent control machine enables precise adjustments to process parameters and data acquisition.