Used LAM RESEARCH TCP 9400 #293752333 for sale

LAM RESEARCH TCP 9400 is a fully automated, highly accurate, etch and asher equipment designed for substrate cleaning and pre-metalization processes. This automated system offers high-quality processes for a variety of substrates, including silicon, glass and quartz. It is ideally suited for overall etch back processing and provides an ideal platform for metal deposition. TCP 9400 offers a number of features that make it highly efficient for substrate etching. It has a fully automated wafer carrier that moves substrates into and out of the alkaline-clean process module utilizing a robot arm, while a built-in controller monitors and controls the entireetcher process. The unit's programmable pressure control automatically adjusts the pressure in the reaction chamber for uniform and consistent polishing of the substrate. Additionally, LAM RESEARCH TCP 9400 operates completely closed-cycle, with all inert components being recovered and recirculated back into the etch process to prevent waste. TCP 9400 uses two etch solutions to ensure uniform etch rates across the entire wafer surface. Each solution contains separate regents for specific wet chemical etching and chemical-mechanical polishing processes. This ensures optimal wetting of the substrate surface and uniform etching of the starting material, providing a consistent surface finish. Additionally, it has a precision temperature control machine with micron-level accuracy for precise process control. This tool also has a built-in optical metrology asset for monitoring the etch process. It enables the operator to observe and monitor the progress of the etching process and the surface profile of the substrate in real-time. The etch process is also monitored and recorded via an online process database so that the user can view process trends and be alerted to any changes. LAM RESEARCH TCP 9400 is a reliable, automated etch and asher model that offers detailed process control, accurate etch rates, and high-performance substrate cleaning and metal deposition. Its combination of features and performance makes it an ideal choice for a variety of substrate etch applications.