Used LAM RESEARCH TCP 9408 SE #9178705 for sale
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ID: 9178705
Wafer Size: 8"
Vintage: 2004
Poly etcher, 8"
Software version: 1.6.012A
SMIF System: (2) ASSYST
Process chemicals: SCCM
(1) AC Power box
(2) RF Racks
TCP RF Match part no: 853-032294-002
Bias RF match: 853-330951-001
ESC Power supply: 810-017086-018
Chamber manometer MKS make (All): E29B-23813
Turbo manometer MKS make (All): 625A-14375
Ref manometer MKS make (All): 625A-14059
Turbo pump: STPH1301L1B
TCP RF Gen.AE make(All): 660-024637-006 RFDS
Bias RF Gen.AE make( All): 3155027-003 B
Wafer drag back: Enable
Wafer offset alignment alignment: 310
Gas ring capacitance: 1300+/- 15 pf
Software version: 1.6.1
MFC Config.CL2-200 sccm: 200
MFC Config.O2-100 sccm: 100
MFC Config.HE/O2-20 sccm: 20
MFC Config.CF4-100 sccm: 100
MFC Config.HBR-500sccm: 500
MFC Config.SF6-100 sccm: 100
MFC Config.HE-500 sccm: 500
MFC Config.CL2-30 sccm: 30
TCP Coil position: 8 O'CLK
Turbo pump capacity: 1300L
Vat valve / Pendulum valve: Pendulum
2004 vintage.
LAM RESEARCH TCP 9408 SE is a powerful standalone etcher and asher equipment. It is a high-performance silicon wafer etcher and asher system specifically designed to meet the most demanding requirements of the semiconductor industry while providing users with the capability to process a wide range of materials. The unit is formed by a precision-engineered, highly automated platform that is equipped with a high-speed, high-quality rotary etch head, providing superb plasma uniformity and reducing etch time. The machine features include a temperature controlled turbo-pump, enabling etching and ashing with maximum repeatability and uniformity, as well as high-end process control, providing users with the capability to precisely control etch rate, overetch, film thickness, and endpoint. TCP 9408 SE is also equipped with a pair of advanced on-board QCM/PCM/FIB detectors and an off-board mass spectrometer, which deliver precise endpoint detection, ensuring precise etch and ashing. Additionally, the tool is fully programmable, allowing users to create various recipes and store them, as well as to quickly recall them and perform etching and ashing with minimal down-time. The user interface is intuitive and user-friendly, enabling operators to conveniently control and monitor the entire process. Furthermore, a range of diagnostics and process monitoring tools available within the user interface, allowing selection and review of the best overall process run. LAM RESEARCH TCP 9408 SE delivers precise and robust etch and ashing, allowing users to achieve the highest levels of process uniformity without sacrificing process throughput. This asset is perfectly suited for etching and ashing processes such as silicon etching, stress relief and dopant sputtering, and offers superior performance for all types of materials, including III-V and high-k dielectrics. Overall, TCP 9408 SE is an excellent etcher and asher model, which further enhances the process repeatability, productivity, and quality of semiconductor manufacturing.
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