Used LAM RESEARCH TCP 9600 SE #293636060 for sale

LAM RESEARCH TCP 9600 SE is an advanced plasma etching equipment engineered for superior etching performance and high productivity. With an overall chamber length of 73 inches, the system is capable of handling single and double-sided wafers with a maximum size of 6 inches. The chamber is vacuum sealed and includes a horizontal etching zone and an isolation zone for controlling substrate loading during the etching process. The unit also features a temperature controlled chamber that maintains the working environment of the wafer at its optimum level. LAM RESEARCH TCP 9600SE is equipped with a fully integrated multi-tool/stations, 350 Volt main power panel, and a range of external manifolds that provide flexible transport routing and process gas delivery (N2, H2, Ar). The machine also utilizes a high-resolution Inductive Coupled Plasma source, which is capable of providing high-energy density plasma with excellent power regulation, enabling better process control and improved etch quality. Additionally, TCP 9600 SE comes with an integrated Software Suite, which provides users with an intuitive control over the tool and allows the user to modify process parameters, such as the duration and plasma power levels of the etching cycle. It also includes a number of automated features like automatic speed and distance control, remote ejector station for vacuum operation, and automatic substrate registration for accurate etching. TCP 9600SE also features a range of safety features such as plasma pressure controls and automatic emergency shutoff, which ensures the safety of personnel and equipment.