Used LAM RESEARCH TCP 9600 SE #9172338 for sale

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ID: 9172338
Vintage: 1994
Etcher With rainbow endpoint detection Water cooled platen Standard recipe 600/601 for Al etching: Etch rate: 800 nm/min Photoresist etch rate: 400 nm/min Standard recipe 640 for Al2O3 etching: Etch rate: 100-120 nm/min Substrate size: 150 mm Diameter Allowed materials: Al, Al2O3, TiO2, Poly Si, Nb Forbidden materials: Non IC-compatible materials Gases: Cl2, BCl3, HBr, SF6, CF4, Ar, N2, O2, He Pressure: 0-100 mTorr Process temperature: 55°C Electrode power: Top: 0-1250 W Lower: 0-1200 W 1994 vintage.
LAM RESEARCH TCP 9600 SE is a highly reliable, high productivity etcher or asher for use in semiconductor fabrication and related industries. It is designed for chemical vapor deposition (CVD) processes, which involve the deposition of thin films or layers on the surface of a substrate or semiconductor wafer. LAM RESEARCH TCP 9600SE offers a range of features designed to improve overall etch rate, uniformity, and chemical composition of the deposited film. TCP 9600 SE's high-performance design is driven by a DirectDrive linear motor, which improves etch uniformity with low drift and is also significantly quieter than conventional brushed motor designs. It also features an advanced thermal control equipment and a wide variety of integrated and programmable options, including digital pattern recognition (DPR), temperature scan, energy scan, and power measurement. The system's advanced electrostatic chuck (ESC) ensures excellent substrate adhesion and uniform heating throughout the process. The etcher can be adjusted to a wide range of substrate sizes, from 200mm and 300mm up to 8-inch, 10-inch, and 12-inch wafers. It features an integrated wafer handler, adjustable heating blocks, and gas flow systems. The unit's motor-driven sub-uniform chamber is designed to reduce particle contamination and maintain an optimal uniform etch rate. TCP 9600SE is a reliable and user-friendly machine. Its intuitive user interface simplifies the operation of CVD processes and helps reduce downtime. In addition, the tool's remote monitoring, data logging, and diagnostic capabilities enable users to monitor their process results and make adjustments from a remote location if necessary. LAM RESEARCH TCP 9600 SE is ideal for demanding semiconductor etching and deposition processes due to its high-performance design, integrated diagnostics and data logging capabilities, and user friendliness. Its robust design ensures reliable operation and maximum overall productivity.
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