Used LAM RESEARCH TCP 9600 SE #9226415 for sale
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ID: 9226415
Wafer Size: 8"
Metal etcher, 8"
Gas box MFC
Temperature controller
Process kit: EPD Sensor
Chuck type: Mechanical
(12) Board checkers
MKS: 13.32 PA
P/C ESC
VAT Valve
SBC Board type: BOSS
Video board type: Floppy disk
VME Type: Hard disk controller slot
WPS Sensor
Slit valve: Mini controller
Robot type: Cassette handler
STO Elevator type: I/O Wafer sensor
EPD Exhaust line
RF Match: L/L Purge, L/L slow vent
RF Generator type: P/C Metal etcher
(8) Motor drivers
CPU
TAITEC CH-800B H/E Chiller
Dry pump
Gauge type: TC XLL Wafer sensor
Monitor
Gas panel
TCP
Top & bottom generator: ADVANCED ENERGY RFG 1250 Bias
Chamber A:
O2: 200 SCCM
CF4: 100 SCCM
O2: 2000 SCCM
H2O: 500 SCCM
CHF3: 20 SCCM
N2: 50 SCCM
CL2: 200 SCCM
BCL3: 200 SCCM
Turbo pump:
EDWARD SCU H1000C
EDWARD STP-1000
Standalone
Autoloader type
STP H1000 with TMP
Bottom match
Wafer shape: Flte
No SMIF interface
MF Facilities
APM Chamber
ELL Arm
Load port
GEM & SESC Interface
Cassette stage
XLL Arm
RF Generator
Chamber type: 9600
Chamber process: Metal
Manometer: 0.1 mT Millipore
Standard cooling water
Top & bottom RF match
Gate valve & Throttle valve: Pendulum valve
STP H-1000L Turbo controller
Standard 4-pin cylinder
EPD Controller: 703/261.8
Chamber gases:
Gases / MFC Size / Gas name / MFC Maker / MFC Model number
Gas 1 / 300 / N2 / AERA / FC-780C
Gas 2 / 200 / N2 / AERA / FC-780C
Gas 3 / 50 / N2 / AERA / FC-780C
Gas 6 / 3000 / N2 / AERA / FC-780C
Gas 7 / 200 / N2 / AERA / FC-780C
Gas 8 / 200 / N2 / AERA / FC-780C
Missing parts:
VDS
Side covers
DSQ Chamber
APM Chuck motor
DI Nozzle
WVDS
Includes:
AC Rack
Cable
Signal cable box
Power: 208V
1996 vintage.
LAM RESEARCH TCP 9600 SE etcher/asher is an advanced wafer etching and ashing equipment, used in the semiconductor fabrication process. It offers a variety of etching and ashing processes, ranging from UV etching to alkaline etching, enabling users to fabricate a wide range of semiconductor devices. The system is designed to be highly user-friendly, featuring intuitive user interfaces and quick controls for process setup. LAM RESEARCH TCP 9600SE utilizes a three-dimensional electrostatic chuck (ESC) to achieve uniform distribution of etching gas and uniform etch uniformity across the wafer surface. This results in highly precise etching and ashing, ensuring that products are produced with the highest possible quality and yield. The high-resolution pins used in the electrostatic chuck helps to ensure the uniform distribution of etch gas and the controlled temperature of the substrate, necessary for precise etching and ashing. TCP 9600 SE comes with a built-in controller, which simplifies the process setup and allows users to quickly select appropriate parameters such as etch rate, substrate, etch pressure, and etch gas composition. Moreover, the unit is equipped with a high-speed motors, enabling users to achieve superior etch uniformity while reducing process time. In addition, the machine features an auto-cleaning function, which automatically cleans the wafer during the process, eliminating particulate and other contaminants from the product. In addition to its efficient etching and ashing capabilities, TCP 9600SE offers a range of additional features, such as a modular design, allowing users to customize their process setup to their own requirements. Moreover, its enhanced thermal management features help to ensure that substrate temperatures are carefully monitored and remain within safe limits throughout the process. Overall, LAM RESEARCH TCP 9600 SE is an advanced etching and ashing tool, offering an intuitive user interface, highly precise etching, and enhanced thermal management. The asset's modular design and enhanced automation allows users to easily customize the process to their own requirements, while its fast speed and auto-cleaning functions help ensure that the highest possible product quality is achieved.
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