Used LAM RESEARCH TCP 9600 SE #9228027 for sale

LAM RESEARCH TCP 9600 SE is a High Aspect Ratio Plasma Asher/Etcher Equipment. It is a thermal and chemical plasma etch system based on the Macrosolver's TCP Technology. This etch unit provides precision pattern transfer along with superior topography optimization. It is capable of generating etch profiles with a depth greater than 10 microns with a high aspect ratio feature size. LAM RESEARCH TCP 9600SE also has the capability for low contact Resistance via molecular adhesion. TCP 9600 SE is best suited for advanced materials and engineering applications with high aspect ratio and high aspect ratio feature sizes. It is the perfect machine for Advanced Manufacturing, Automotive, Power electronics, and Materials applications. The high aspect ratio capability and low contact resistance it offers makes it a versatile etch and deposition machine for customers that demand accuracy and speed. TCP 9600SE has three independent source chambers for reactant gas delivery and a large, 5-target high-purity RF generator for precision etching. The 4-inch diameter radiant isolated high-purity quartz process chamber ensures highest uniformity, low particle levels and rapid process recovery times. An advanced high-resolution video imaging tool allows full control of the process window wafer-by-wafer. In addition, the integrated two-gun cathodic arc technique provides uniform and efficient deposition of high-purity Ti, TiN, AlN, Al2O3 and PVD hard chromium/Cobalt. LAM RESEARCH TCP 9600 SE is equipped with LAM's proprietary Process Control Tool (PCT) to realize full experience of repeatable, predictable process performance. The tool provides effective control on the arc deposition uniformity, current and power control, Process Diagnostic Tool (PDT) with embedded Statistical Process Control (SPC) and advanced source gas management for multi-gas delivery. LAM RESEARCH TCP 9600SE comes with a multiple vacuumgate asset for enhanced source gas isolation and a larger source gas manifold for improved gas flow control. A range of independent throughput options are available to suit various process throughput needs in the automated environment. The compatible parts range from 400mm substrates with any shape, low-molecular depositions and advanced metals etch. TCP 9600 SE is compatible with WADD and SFT formats, SECS/GEM, ProdLink and Software Remote Data Access protocols. Additionally, this model meets the latest safety regulations such as ECE, UL, IEC, and CSA.