Used LAM RESEARCH TCP 9600 SE #9268139 for sale

LAM RESEARCH TCP 9600 SE is an advanced etching solution for a variety of substrates, including semiconductor and quartz materials, and other special materials. LAM RESEARCH TCP 9600SE is powered by a state-of-the-art Windows operating equipment, allowing for fast and easy connection to other peripherals. The reactive ion etching (RIE) technology uses an active beam of global ions to create precisely etched features into a wide variety of substrates. The system's advanced controls provide both nitride etching and photoresist stripping capabilities, with a wide range of customizable parameters for optimal results. The easy-to-use control interface allows for easy programming of parameters, such as etching velocity, temperature, gas flow and chamber pressure. The etcher has a large equipment footprint, allowing for integration into larger production lines, while its fixture versatility enables it to handle a variety of substrates. The 9600 SE is equipped with an advanced RF generator, providing uniform etching of virtually any required surface geometry. The generator remains in compliance with tight RIE impedance control to ensure consistent etching results. It also has a plasma cleaning capability, allowing for the removal of organic residues, surface oxide layers and metal oxide layers. This enables the unit to etch components down to a very high level of accuracy. TCP 9600 SE has a sophisticated vacuum chamber, providing ultra-stable and repeatable etching performance. The chamber is custom-designed for RIE, featuring an advanced vacuum pumping machine and a single-crystal diamond-like coating over all chamber walls. This ensures optimal etching precision and repeatability. Additionally, the 9600 SE is finished with electro-polished chamber walls, allowing for a long lifecycle with optimal etching quality. Overall, TCP 9600SE is a sophisticated etching tool, designed to provide ultimate precision and repeatability with minimal users' involvement. Its advanced RIE technology and integrated RF generator, provide a high level of etching accuracy for a wide variety of components and substrates. Its single-crystal diamond-like coating and electro-polished walls ensure unsurpassed vacuum and repeatability performance, while its integrated Windows operating asset ensure fast and easy model connection.