Used LAM RESEARCH TCP 9600 #293805103 for sale

LAM RESEARCH TCP 9600 is a plasma etcher/asher equipment used in the semiconductor industry. The system is designed to precisely pattern and etch or asher surfaces with a high repeatability and accuracy. LAM RESEARCH TCP9600 employs two individual source chambers that are separately configurable allowing for optimized etch rates for dielectric, metal and silicon oxide materials. The unit utilizes a sophisticated and efficient new process that is based on LAM RESEARCH proprietary low-pressure inductive coupled plasma sources. The plasma sources allow for high-precision etching and ashing of structures from metal layers, silicon oxide and nitride materials. The machine's innovative source chambers are designed to create high-purity and reliable process results, ensuring consistent performance and providing a cost-effective solution. The fully-automatic systems offers a high degree of process control and feedback, resulting in reduced costs and greater uptime. TCP-9600 also comes with a wide range of LAM RESEARCH software features that allow for easy and accurate process recipe setup, execution and process optimization, ensuring optimal etch results. The LAM TCP 9600 enables the etching and ashing of dielectric, metal and silicon oxide materials with excellent precision and repeatability, in a cost-effective manner. The two independent source chambers, the integrated automation and the common control tool allows for quick and easy process setup an execution. The etch chamber is also equipped with load locks, and optional external and rear loadlock systems allow for high throughput. The unique plasma source setup enables environment friendly and low-consumption workflows, as well as high process uniformity, repeatability and stability. Additionally, the asset has a unique exhaust treatment feature and requires very little maintenance, which is both environment-friendly and cost efficient. Overall, TCP9600 etcher/asher is an advanced model that is designed to ensure precision, repeatability and accuracy while processing dielectric, metal and silicon oxide materials. The two source chambers, the common control equipment and the sophisticated process control and feedback offer a cost-effective and efficient solution. The system also allows for easy recipe setup and execution as well as process optimization for optimal etch results. With its environment-friendly design and low-maintenance setup, LAM RESEARCH TCP-9600 is a reliable and cost-effective unit for etching and ashing of semiconductor materials.