Used LAM RESEARCH TCP 9600 #293809935 for sale
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LAM RESEARCH TCP 9600 is a powerful etcher/asher equipment designed to accurately process wafers with precision and high throughput. It is equipped with a robust, precise closed-loop etch system and has the capability to handle fully automated production with precise temperature control and accurate cycle times. The unit features a fully-programmable onboard Source/Drain Implant source that can be tailored to each semiconductor device fabrication process. This machine is capable of handling high speed etching and ashing operations with a broad range of materials and applications. LAM RESEARCH TCP9600 is a modular, high-precision etching and ashing tool, capable of a variety of etch and ash operations depending on the application. It has a single-chamber design with a dedicated etch and ash chamber, offering a temperature range of up to 500°C. The asset is also outfitted with a heavy-duty precision motor, allowing for precise control of the etch rate. It also includes a number of advanced programmable features for precise control of the ashing rate, flow rates, and pressure. TCP-9600 also offers high speed and throughput, providing up to 200 mm/min etch rates and up to 400mm/min ash rates. The model is designed to accommodate up to eight processes, each with three level depths and seven levels of etching. It also has a comprehensive pattern coverage with features such as automatic border detection, sidewall profiling, and overcut protection. TCP 9600 is a reliable equipment and is designed to ensure maximum uptime during production. It is equipped with an advanced process tracking system that logs activities and events, and can be used to monitor the unit performance. For ease of maintenance, TCP9600 is also equipped with a self-monitoring machine that performs periodic tests on the etch chamber, safety valves, and motor. LAM RESEARCH TCP-9600 is a robust and reliable etch and ashing tool that provides precise material processing and high throughput. It is a highly adaptable solution for modern semiconductor device fabrication processes, and its advanced features for precise etching and ashing make it an ideal solution for a variety of industrial applications.
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