Used LAM RESEARCH TCP 9600 #293809943 for sale

LAM RESEARCH TCP 9600 is an etcher/ asher specifically designed for high-volume plasma processing. It is built on a dual-chamber platform, allowing simultaneous plasma etching of multiple substrates and enabling fast switchover between chambers for batch operations. The process chamber is designed to accommodate two substrate sizes up to 8 inches in diameter and is equipped with an 8-process gas delivery equipment, allowing for tight process control. The integrated vacuum system provides low particle contamination levels and a large linearly moved RF antenna shortens the etching time. A polished stainless-steel chamber ensures minimal maintenance and a long life. LAM RESEARCH TCP9600 is equipped with control software that automates the entire etching process and monitors every step. The main control console provides a graphical user interface for easy operation, with a direct Ethernet connection for remote monitoring and control. It also includes a library of standard recipe settings, providing users with a set of preprogrammed recipes to get the etching job started. The user can access the recipe library, change the parameters and save them in memory. In addition, a network connection allows multiple units to be monitored and controlled remotely. The unit is further equipped with a 500W RF power generator, providing the energy required in the plasma etching process. The multi-mode operation enables it to work both in hard-etch and soft-etch modes. The unique latching machine of the RF radiates also allows TCP-9600 to operate at a consistent pressure, providing uniform etching across multiple substrates. LAM RESEARCH TCP-9600 features an automatic gas mixing tool with a built-in gas mixing manifold and a two-stage, linear gate valve to ensure accurate mixing and easy maintenance. Multi-zone mixing technology allows users to adjust the recipe settings based on the materials they are etching. The sub-micron, high resolution 3D imaging technology ensures high quality pattern formation. The built-in vacuum asset helps minimize gas and chemical exposure, while the embedded software provides alarm protection and easy maintenance. Overall, TCP9600 offers a reliable, user-friendly etching model that meets the needs of any high-volume production. With its powerful performance and advanced features, the equipment outperforms its competitors in terms of precision and accuracy, making it the ideal choice for manufacturers. These features make it a must-have for those who want maximum efficiency and value out of their plasma processing operations.